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A SERS sensor for quantitatively detecting the concentration of mercury ions in water samples and its preparation method

A quantitative detection, mercury ion technology, applied in the field of biological and Raman spectroscopy detection, can solve the problems of low detection accuracy, high post-processing requirements, unsuitable for water sample detection, etc., to achieve rapid detection, convenient detection process, good specificity Effect

Active Publication Date: 2016-08-24
SUZHOU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, these methods have relatively high requirements for sample post-processing, and the detection accuracy is relatively low, so they are not suitable for the detection of actual water samples.

Method used

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  • A SERS sensor for quantitatively detecting the concentration of mercury ions in water samples and its preparation method
  • A SERS sensor for quantitatively detecting the concentration of mercury ions in water samples and its preparation method
  • A SERS sensor for quantitatively detecting the concentration of mercury ions in water samples and its preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0057] (a) Preparation of silicon nanowire arrays by hydrogen fluoride assisted etching method:

[0058] (1) The silicon wafer is firstly ultrasonically cleaned with deionized water, acetone, and deionized water, and then put into a mixed solution of concentrated sulfuric acid and hydrogen peroxide (concentration: 40wt%) (volume ratio=1:0.01) for further cleaning, Then rinse with deionized water to obtain a clean silicon wafer. (2) Place the cleaned silicon wafer into hydrogen fluoride solution (concentration: 1wt%) for silicon-hydrogenation reaction, shake slowly for 1 minute, and obtain a silicon wafer covered with a large number of silicon-hydrogen bonds (Si-H). (3) Put the silicon wafer obtained after the above treatment into a mixed solution (volume ratio = 1:0.01) of silver nitrate (concentration: 1M) and hydrogen fluoride (concentration: 40wt%), and shake slowly for 1 minute to make the silicon wafer A layer of silver nanoparticles can be uniformly grown in situ on the...

Embodiment 2

[0064] (a) Preparation of silicon nanowire arrays by hydrogen fluoride assisted etching method:

[0065] (1) The silicon wafer is firstly ultrasonically cleaned with deionized water, acetone, and deionized water, and then put into a mixed solution of concentrated sulfuric acid and hydrogen peroxide (concentration: 40wt%) (volume ratio=1:0.1) for further cleaning, Then rinse with deionized water to obtain a clean silicon wafer. (2) Place the cleaned silicon wafer into a hydrogen fluoride solution (concentration: 5wt%) for silicon-hydrogenation reaction, shake slowly for 10 minutes, and obtain a silicon wafer covered with a large number of silicon-hydrogen bonds (Si-H). (3) Put the silicon wafer obtained after the above treatment into a mixed solution (volume ratio = 1:0.1) of silver nitrate (concentration: 1M) and hydrogen fluoride (concentration: 40wt%), and shake slowly for 10 minutes to make the silicon wafer A layer of silver nanoparticles can be uniformly grown in situ on...

Embodiment 3

[0071] (a) Preparation of silicon nanowire arrays by hydrogen fluoride assisted etching method:

[0072] (1) The silicon wafer is firstly ultrasonically cleaned with deionized water, acetone, and deionized water, and then put into a mixed solution of concentrated sulfuric acid and hydrogen peroxide (concentration: 40wt%) (volume ratio=1:1) for further cleaning, Then rinse with deionized water to obtain a clean silicon wafer. (2) Put the cleaned silicon wafer into a hydrogen fluoride solution (concentration: 10wt%) for silicon-hydrogenation reaction, shake slowly for 20 minutes, and obtain a silicon wafer covered with a large number of silicon-hydrogen bonds (Si-H). (3) Put the silicon wafer obtained after the above treatment into a mixed solution (volume ratio = 1:1) of silver nitrate (concentration: 1M) and hydrogen fluoride (concentration: 40wt%), and shake slowly for 20 minutes to make the silicon wafer A layer of silver nanoparticles can be uniformly grown in situ on the ...

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Abstract

Aiming at the shortcomings of atomic absorption spectrometry and atomic emission spectrometry to detect mercury ion technology, sample post-processing requirements are relatively high, detection accuracy is relatively low, and it is not suitable for actual water samples, a SERS for rapid quantitative detection of mercury ion concentration in actual water samples is disclosed. The sensor and its preparation method combine DNA technology with SERS technology. First, hydrogen fluoride-assisted etching is used to prepare silicon nanowire arrays, and then gold nanoparticles are grown in situ to prepare gold nanoparticle-modified silicon nanowire arrays. Finally, a gold nanowire array is constructed. Nanoparticle-modified silicon nanowire array SERS sensor; the SERS sensor of the present invention can complete the entire reaction process at room temperature to achieve the purpose of rapid detection of mercury ions, the detection limit of mercury ions is 1pM, and has good specificity , reproducibility, reusability, convenient detection process, and can be used for the detection of actual water samples of mercury ions.

Description

technical field [0001] The invention belongs to the technical field of biological and Raman spectrum detection, and relates to a Surface-Enhanced Raman Scattering (Surface-Enhanced Raman Scattering, full text abbreviation: SERS) sensor and a preparation method thereof, in particular to a method for quantitatively detecting the concentration of mercury ions in an actual water sample SERS sensor and its preparation method. Background technique [0002] Mercury is a common toxic heavy metal, mainly divalent mercury ion (Hg 2+ ) form, which can cause great harm to human health and the environment. The damage of mercury compounds to the human body is related to the amount of mercury entering the body. The United States Environmental Protection Agency stipulates that the content of mercury ions in drinking water should not be higher than 10nM. The harm of mercury to the human body mainly involves the central nervous system, digestive system and kidneys, and also has certain effe...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/65
Inventor 何耀孙斌
Owner SUZHOU UNIV