Method for discriminating nonlinearity of pressure sensors under influence of internal stress
A technology of pressure sensor and discrimination method, applied in the direction of measuring fluid pressure, instrument, force/torque/work measuring instrument calibration/test, etc., can solve the problems of film structure damage, film peeling, cracking, etc., and achieve high accuracy , The method is simple, the effect of optimizing the design
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[0027] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments, but the protection scope of the present invention is not limited thereto.
[0028] Taking a low-stress silicon nitride film as an example of a pressure sensor structural layer film, the non-linear discrimination method of an absolute pressure sensor under the influence of internal stress according to the present invention is described in detail.
[0029] First, the low-pressure chemical vapor deposition (LPCVD) method is used to adjust the flow ratio of dichlorodihydrogen silicon and ammonia, and at a growth temperature of 850 ° C, a low-stress silicon nitride film (LS SiN for short) is deposited, and this low The stressed silicon nitride film is used as the structural layer film of the pressure sensor chip.
[0030] Using Hysitron's TriboIndenter nano-indentation system, the Young's modulus of LS SiN is obtained through continuous control and re...
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