Corrosion resistant coating layer with self-repair capacity and preparation method thereof
A corrosion-resistant coating and self-repairing technology, applied in the coating, metal material coating process, ion implantation plating, etc., can solve the problems of aggravated substrate corrosion, coating failure, coating peeling, etc., to improve corrosion resistance Life, enhanced corrosion resistance, high deposition rate effect
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Embodiment 1
[0090] (1) Substrate cleaning
[0091] Chemical cleaning: use polished 304 stainless steel as the substrate, clean it, put in a 50% decontamination powder aqueous solution, and saturate with Na 2 CO 3 Water solution, acetone, absolute ethanol, and deionized water were each ultrasonically cleaned for 20 minutes, and then air-dried in a drying oven at a temperature of 100 °C for 2 hours.
[0092] Plasma glow etching cleaning: put the chemically cleaned substrate on the sample stage in the vacuum chamber, when the vacuum is lower than 1×10 -3 After Pa, argon gas was introduced and the pressure was maintained at 1.5 Pa, then the power was turned on and a negative bias was applied to the substrate at the same time, and the plasma glow generated by argon gas was used to etch and clean it for 10 minutes.
[0093] (2) Coating deposition
[0094] Put the cleaned matrix on the rotatable sample stage in the vacuum chamber, when the vacuum degree of the chamber is less than 2.2×10 - ...
Embodiment 2
[0101] (1) Substrate cleaning
[0102] Chemical cleaning: use polished 304 stainless steel as the substrate, clean it, put in a 50% decontamination powder aqueous solution, and saturate with Na 2 CO 3 Water solution, acetone, absolute ethanol, and deionized water were each ultrasonically cleaned for 10 minutes, and then air-dried in a drying oven at a temperature of 100°C for 2 hours.
[0103] Plasma glow etching cleaning: put the chemically cleaned substrate on the sample stage in the vacuum chamber, when the vacuum is lower than 1×10 -3 After Pa, argon gas was introduced and the pressure was maintained at 2 Pa, then the power was turned on and a negative bias was applied to the substrate at the same time, and the plasma glow generated by argon gas was used to etch and clean it for 20 minutes.
[0104] (2) Coating deposition
[0105] Put the cleaned matrix on the rotatable sample stage in the vacuum chamber, when the vacuum degree of the chamber is less than 2.2×10 - 5 P...
Embodiment 3
[0112] (1) Substrate cleaning
[0113] Chemical cleaning: use polished 304 stainless steel as the substrate, clean it, put in a 50% decontamination powder aqueous solution, and saturate with Na 2 CO 3 Water solution, acetone, absolute ethanol, and deionized water were each ultrasonically cleaned for 10 minutes, and then air-dried in a drying oven at a temperature of 100°C for 2 hours.
[0114] Plasma glow etching cleaning: put the chemically cleaned substrate on the sample stage in the vacuum chamber, when the vacuum is lower than 1×10 -3 After Pa, argon gas was introduced and the pressure was maintained at 1 Pa, then the power was turned on and a negative bias was applied to the substrate at the same time, and the plasma glow generated by argon gas was used to etch and clean it for 15 minutes.
[0115] (2) Coating deposition
[0116] Put the cleaned matrix on the rotatable sample stage in the vacuum chamber, when the vacuum degree of the chamber is less than 3.1×10 - 5 P...
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