The invention discloses an ultrahigh vacuum magnetron
sputtering rectangular plane
sputtering target, which comprises a
cooling pipe (6) which runs through a mounting
flange (1) and is connected with water-cooling cavity parts (5) in a target shielding cover (3). Especially, (a): the
cooling pipe (6) is connected with the mounting
flange (1) by a sealing part (2) of the
cooling pipe; (b), the water-cooling cavity parts (5) are an upper
flange (511) and a lower flange (512) of the water-cooling cavity which are connected with a screw (53) by a sealing ring (52); the lower flange (512) of the water-cooling cavity is internally provided with a soft iron (58) and a permanent
magnet (54); the cooling
pipe (6) is communicated with the water-cooling cavity parts by
welding after running through the bottom of the water-cooling cavity parts; a nut (57) is against and connected with an insulating sleeve
gasket (56) sheathed on the outside of the cooling
pipe by the external thread of the cooling
pipe (6) in a pressing way; (c), the rectangular plane
sputtering target further comprises at least one supporting screw (10) and a sealing part (7) of the supporting screw which is connected with the supporting screw in a matching way. The vacuum degree of the ultrahigh vacuum magnetron sputtering rectangular plane sputtering target reaches up to more than 6*10<-6>Pa, which can be used for high-quality
coating of work pieces with large surface area.