Preparation method of auto-polymerizable nonsaturated ester with adamantane structure

Abstract

The invention relates to a preparation method of auto-polymerizable nonsaturated ester with an adamantane structure. The preparation method of the monomer comprises the following steps: simultaneously adding 4-hydroxy-4'-carboxyl-benzophenone and tertiary amine into an organic solvent and stirring, dissolving adamantyl acyl chloride in the organic solvent to obtain an acyl chloride organic solution, dropwise adding the acyl chloride organic solution into a three-necked flask within 3 hours, continuously stirring a reaction solution for 5 hours after adding dropwise and reacting at the reaction temperature of 0-5 DEG C, carrying out aftertreatment on the above solution, slowly adding a nonsaturated alcoholic solution into the treated solution, and washing with an acid solution so as to obtain the auto-polymerizable nonsaturated ester monomer with the adamantane structure. The product has both an adamantane structure and a benzophenone structure. Corrosion resistance of the product is enhanced, and the product also can automatically carry out photopolymerization.

Description

technical field

[0001] The invention belongs to the field of photosensitive polymer materials, and in particular relates to a preparation method of self-polymerizable unsaturated ester with adamantane structure. Background technique

[0002] Photoresist is a key chemical material in the microfabrication technology of integrated circuits. Photoresist, also known as photoresist, is a light-sensitive mixed liquid composed of three main components: photosensitive resin, sensitizer and solvent. After the photosensitive resin is exposed to light, the photocuring reaction can quickly occur in the exposed area, so that the physical properties of the material, especially the solubility and affinity, will change significantly. After being treated with an appropriate solvent, the soluble part is dissolved to obtain the desired image. According to its chemical reaction mechanism and development principle, it can be divided into two types: negative gel and positive gel. The imaging re...

Examples

Embodiment 1

[0025] Preparation of 2-adamantyl acrylate

[0026] After adding 5g of 4-hydroxy-4'-carboxy-benzophenone, 4.18g of triethylamine and 100mL of toluene into a three-necked flask with a mechanical stirring device, the reaction temperature was 2°C, and 6.15g of adamantyl Acyl chloride, then dissolve it in 40mL toluene, and drop it into a three-necked flask within 3 hours. After the dropwise addition, continue to stir for 5 hours, and let it stand overnight. The above solution is post-treated to remove the remaining adamantylformyl chloride . Then slowly add 2.4 g of propylene enol solution to the treated solution. After the reaction is completed, wash with an acidic solution and perform post-treatment to obtain a self-polymerizable unsaturated ester monomer with an adamantane structure. (productive rate is 51.7%), its structural formula is as follows

[0027] .

technical field

[0001] The invention belongs to the field of photosensitive polymer materials, and in particular relates to a preparation method of self-polymerizable unsaturated ester with adamantane structure. Background technique

[0002] Photoresist is a key chemical material in the microfabrication technology of integrated circuits. Photoresist, also known as photoresist, is a light-sensitive mixed liquid composed of three main components: photosensitive resin, sensitizer and solvent. After the photosensitive resin is exposed to light, the photocuring reaction can quickly occur in the exposed area, so that the physical properties of the material, especially the solubility and affinity, will change significantly. After being treated with an appropriate solvent, the soluble part is dissolved to obtain the desired image. According to its chemical reaction mechanism and development principle, it can be divided into two types: negative gel and positive gel. The imaging re...

Examples

Embodiment 1

[0025] Preparation of 2-adamantyl acrylate

[0026] After adding 5g of 4-hydroxy-4'-carboxy-benzophenone, 4.18g of triethylamine and 100mL of toluene into a three-necked flask with a mechanical stirring device, the reaction temperature was 2°C, and 6.15g of adamantyl Acyl chloride, then dissolve it in 40mL toluene, and drop it into a three-necked flask within 3 hours. After the dropwise addition, continue to stir for 5 hours, and let it stand overnight. The above solution is post-treated to remove the remaining adamantylformyl chloride . Then slowly add 2.4 g of propylene enol solution to the treated solution. After the reaction is completed, wash with an acidic solution and perform post-treatment to obtain a self-polymerizable unsaturated ester monomer with an adamantane structure. (productive rate is 51.7%), its structural formula is as follows

[0027] .

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