A kind of preparation method of asymmetric supercapacitor
A kind of supercapacitor, asymmetric technology, applied in hybrid/electric double layer capacitor manufacturing, manufacturing microstructure devices, decorative arts, etc., can solve the problem of small capacitance of asymmetric electrochemical supercapacitors, and achieve simple and feasible carbonization process , low investment cost, wide application prospects
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[0027] A method for preparing an asymmetric supercapacitor, comprising the steps of:
[0028] S1: Select two 2cm×2cm silicon wafers as substrates, and wash the substrates in hydrogen peroxide, sulfuric acid / hydrogen peroxide, hydrochloric acid / ammonia, and hydrogen peroxide solution to remove oil, oxide film and metal ions, and then dry them;
[0029] S2: Put the cleaned and dried silicon wafer base into an oxidation furnace for oxidation. The oxidation method is dry oxidation or wet oxygen oxidation. The oxidation time is 5 hours, and a silicon dioxide oxide film is formed on the surface of the silicon wafer base as an electrode. Insulation layer, the thickness of the insulation layer is 1.5 microns;
[0030] S3: Place one of the silicon substrates forming the insulating layer in the deposition system device, and deposit a metal titanium layer on the surface of the silicon substrate by deposition, with a thickness of 400nm;
[0031] S4: Put the titanium layer formed in S3 in...
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