Method for performing pulse chromium plating based on trivalent chromium in sulfate system
A technology of trivalent chromium and sulfate, applied in the field of electrochemistry, can solve problems such as enlargement and difference in ion concentration, and achieve the effects of low resistivity, tight arrangement, and reduced pores
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Publication Date
- 2015-06-10
- Estimated Expiration
- Not applicable · inactive patent
Abstract
Description
[0001] Technical field
[0001] The present invention relates to the technical field of electrochemistry, in particular to a kind of pulse electroplating efficient environment-friendly metallurgical method based on sulfate system trivalent chromium plating thick chromium. Background technique
[0002] Traditional process of DC electroplating: During DC electroplating, the metal ions plated out in the plating solution are gradually consumed in the solution near the cathode surface, resulting in a difference in the concentration of the metal ions to be plated and the ions in the solution. This difference increases as the current density used increases. When the concentration of this ion in the liquid layer near the cathode drops to 0, the so-called limiting current density is reached, and the mass transfer process is completely controlled by diffusion.
[0003] Contents of the invention
[0004] (1) Technical problems to be solved
[0005] The technical problem to be solved by...
Examples
Embodiment Construction
[0015] The following examples are used to illustrate the present invention, but not to limit the scope of the present invention.
[0016] A pin-disc friction and wear tester (TRB 01-02539) was used to measure the wear performance of the coating on the plated parts.