Manufacturing method of metal mesh conducting film, metal mesh conducting film and touch panel

Abstract

The invention discloses a manufacturing method of a metal mesh conducting film. The manufacturing method includes the steps that a metal ink coating is formed on a substrate; the metal ink coating is baked; the baked metal ink coating forms a metal mesh through laser sintering; the part, not sintered, of the metal ink coating is cleared away to obtain the metal mesh conducting film. The invention further discloses the metal mesh conducting film and a touch panel. The manufacturing method of the metal mesh conducting film is simple in technology, low in cost and capable of manufacturing the metal mesh conducting film flexible to pattern and the touch panel.

Description

technical field [0001] The invention belongs to the technical field of touch screen manufacturing, and in particular relates to a method for manufacturing a metal grid conductive film for a touch screen, a metal grid conductive film produced by the method, and a touch panel using the metal grid conductive film. Background technique [0002] At present, most capacitive touch panels use the ITO (indium tin oxide) conductive film with mature production technology, but the ITO conductive film has its insurmountable shortcomings: the resistance of ITO is high, and it is not suitable for making medium and large size touch panels; ITO is fragile and has poor flexibility, which is not conducive to the production of flexible panels; high sputtering temperature can easily cause damage to the plastic film and limit the process. [0003] Metal mesh transparent conductive film (Metal Mesh) has the advantages of low resistance, fast response speed, and good flexibility. It is especially s...

AI Technical Summary

Problems solved by technology

[0002] At present, most capacitive touch panels use the ITO (indium tin oxide) conductive film with mature production technology, but the ITO conductive film has its insurmountable shortcomings: the resistance of ITO is high, and it is not suitable for making medium and large size touch panels; ITO is fragile and has poor flexibility, which is not conducive to the production of flexible panels; high sputtering temperature can easily cause damage to the plastic film and limit the process

The metal film photolithography method first forms a layer of metal film on a transparent substrate by sputtering process or metal foil bonding, and then obtains a fine metal grid through steps such as photoresist coating, exposure, development, etching and stripping. The method has many steps, serious waste of metal materials, high cost, and great environmental pollution; the nano-metal ink printing method is achieved by inkjet printing (Inkjet Printing), aerosol-jet printing (Aerosol-Jet Printing) or gravure printing (Gravure Printing), etc. The method is to print nano-metal ink on a transparent substrate and sinter it. This method minimizes the waste of materials, but this method has high requirements on the stability of the ink, and it is difficult to obtain a metal grid with a line width of less than 30 microns; nano-metal The principle of the ink self-assembly method is to apply nano-metal ink to the substrate, and use the hydrophilic / hydrophobic interaction between the solution and the substrate to self-assemble to form an irregularly shaped metal grid. This metal grid is conducive to Eliminate moiré, but it is difficult to control the shape of the pattern. If it is to be applied on a touch screen, it is still necessary to perform patterning on the metal grid by laser etching or chemical etching; The groove network pattern is embossed on the substrate, and then the nano-metal ink is filled into the groove network through precise coating, and finally solidified into a metal grid. This method can improve the metal grid's easy scratch and weak adhesion to the substrate However, it is difficult to accurately fill the nano-metallic ink into the groove to ensure the continuous line and remove the residual nano-metallic ink outside the groove; the silver salt emulsion development method uses silver halide film, after exposure, development and fixing Form a silver metal grid pattern. This method has flexible grid pattern design and low cost, but the process is still relatively complicated

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