Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Radio frequency integrated circuit chip and method of forming the same

A radio frequency integrated circuit and chip technology, applied in circuits, electrical components, electrical solid devices, etc., can solve problems such as harmonic distortion, adverse effects of signal linearity characteristics, etc., and achieve the effect of improving transmission quality

Active Publication Date: 2017-12-01
SEMICON MFG INT (SHANGHAI) CORP
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] For radio frequency integrated circuit chips (Chips) fabricated on Semiconductor-On-Insulator (SOI), when radio frequency signals pass through active devices and passive devices (such as transmission lines or inductors, etc.) in radio frequency integrated circuits , the RF signal will be coupled with the silicon-on-insulator substrate, resulting in harmonic distortion (Harmonic Distortion), which will have a great adverse effect on the linearity of the signal
[0005] To this end, a new radio frequency integrated circuit chip and its formation method are needed to prevent harmonic distortion caused by coupling between radio frequency signals and silicon-on-insulator substrates

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Radio frequency integrated circuit chip and method of forming the same
  • Radio frequency integrated circuit chip and method of forming the same
  • Radio frequency integrated circuit chip and method of forming the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0033] Such as figure 1 As shown, the existing radio frequency integrated circuit chip includes a semiconductor-on-insulator structure (not labeled), and the semiconductor-on-insulator structure includes a high resistance substrate 101 (High Resistance handle wafer), a buried oxide layer 102 (Buried Oxide) on the substrate 101, and A semiconductor substrate 103 located on the buried oxide layer 102 . A shallow trench isolation structure 104 (STI) is usually formed in the semiconductor substrate 103, and a dielectric layer 105 (usually an interlayer dielectric layer or an intermetallic dielectric layer) is formed on the semiconductor substrate 103, and a dielectric layer 105 is formed on the dielectric layer 105. A device 106 (usually an active device or a passive device), wherein the passive device is usually located above the shallow trench isolation structure 104 .

[0034] Since the buried oxide layer 102 and the shallow trench isolation structure 104 inevitably carry fixe...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A radio frequency integrated circuit chip and its forming method, the radio frequency integrated circuit chip includes: a semiconductor-on-insulator structure, which includes a base, a buried oxide layer and a semiconductor substrate, the semiconductor substrate has a shallow trench isolation structure; filling layer, which penetrates the shallow trench isolation structure and the buried oxide layer, and fills part of the substrate to separate the substrate from the shallow trench isolation structure and the buried oxide layer; a dielectric layer, located in the The semiconductor substrate, the shallow trench isolation structure and the filling layer; the radio frequency device is located on the dielectric layer. Since the base and the buried oxide layer are separated by the filling layer, no charge inversion layer or charge accumulation layer is formed between the base and the shallow trench isolation structure or the buried oxide layer, thereby preventing the base from appearing like a channel-like conductive layer , so there will be no coupling capacitance between the RF device and the substrate, and no harmonic distortion will occur when the RF signal passes through the device, improving the transmission quality of the RF signal.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a radio frequency integrated circuit chip and a forming method thereof. Background technique [0002] Radio Frequency Integrated Circuit (RFIC), strictly speaking, refers to analog circuits that work in the frequency band above 0.8GHz, including microwave and millimeter wave circuits. [0003] Radio frequency integrated circuits mainly include filters, low noise amplifiers (LNA), voltage controlled oscillators (VCO), mixers, amplifiers / drivers, frequency synthesizers, power amplifiers (PA) and power management circuits. These radio frequency integrated circuits can be used to form a radio frequency transceiver, in which LNA, VCO, mixer, driver, etc. can be used to form the receiving front end of the signal receiving chain, that is, the receiver system; and the frequency synthesizer and power amplifier are used to form the transmitter. . The application of radio freque...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/762H01L23/66
Inventor 朱岩岩侯飞凡
Owner SEMICON MFG INT (SHANGHAI) CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products