A kind of preparation method of the au catalyst that is used to prepare ka oil
A technology for catalysts and preparation steps, applied in the field of preparation of self-supporting two-dimensional nano-Au catalysts, to achieve the effect of saving production costs
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0025] 1) SrTiO 3 (111) The single crystal is placed in a quartz burning boat, and the burning boat and SrTiO 3 Put the single wafer into the annealing furnace, heat the furnace temperature to 800°C at a speed of 10°C / min, keep it for 6h, and then cool it to room temperature with the furnace. 3 The surface is crystallized;
[0026] 2) The crystallized SrTiO 3 Clean the surface by ultrasonication for 10 minutes in 5% NaOH dilute solution and absolute alcohol respectively;
[0027] 3) The purified SrTiO 3 Put it into the chamber of the magnetron sputtering coating machine, pump the chamber to 6×10 - 4 Pa, the gas sputtering pressure is 0.6Pa, the reverse sputtering power is 30W, the reverse sputtering time is 30min, the sputtering power is 10W, the deposition temperature is 100°C, and the thickness of the Au film is controlled at 10nm by a film thickness meter. In its XRD pattern, It shows only the existence of Au (111) diffraction peak, and the Phi scan pattern shows the ...
Embodiment 2
[0029] 1) SrTiO 3 (111) The single crystal is placed in a quartz burning boat, and the burning boat and SrTiO 3 Put the single wafer into the annealing furnace, heat the furnace temperature to 850°C at a rate of 10°C / min, keep it for 8h, and then cool it to room temperature with the furnace. 3 The surface is crystallized;
[0030] 2) The crystallized SrTiO 3 Clean the surface by ultrasonication for 10 minutes in 2% NaOH dilute solution and alcohol respectively;
[0031] 3) The purified SrTiO 3 Put it into the chamber of the magnetron sputtering coating machine, pump the chamber to 8×10 - 4 Pa, gas sputtering pressure 0.6Pa, reverse sputtering power 30W, reverse sputtering time 50min, sputtering power 5W, deposition at 100°C, the thickness of the Au film was controlled at 10nm by a film thickness meter, XRD and Phi scanning patterns and implementation The spectrum of Example 1 is consistent, which indicates that the deposited Au film is a single crystal film with (111) or...
Embodiment 3
[0033] 1) SrTiO 3 (111) The single crystal is placed in a quartz burning boat, and the burning boat and SrTiO 3 Put the single wafer into the annealing furnace, heat the furnace temperature to 900°C at a speed of 15°C / min, keep it for 6h, and then cool it to room temperature with the furnace. 3 The surface is crystallized;
[0034] 2) The crystallized SrTiO 3 Clean the surface by ultrasonicating in 5% NaOH dilute solution and alcohol for 10 minutes respectively;
[0035] 3) The purified SrTiO 3 Put it into the chamber of the magnetron sputtering coating machine, pump the chamber to 6×10 - 4 Pa, gas sputtering pressure 1.2Pa, reverse sputtering power 50W, reverse sputtering time 30min, sputtering power 8W, deposition temperature 80°C, the thickness of the Au film was controlled at 10nm by a film thickness meter, and it was found that only Au(111) The existence of diffraction peaks, XRD and Phi scan patterns are consistent with the patterns of Example 1.
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 


