Preparation method of high-manganese alloy film Mn53Ni23Ga24
A technology of high manganese alloy and thin film, which is applied in the preparation of high manganese alloy thin film Mn53Ni23Ga24 and the preparation of high manganese ferromagnetic shape memory alloy thin film. low degree of effect
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Embodiment 1
[0024] Take three kinds of metal elements with purity of 99.95at.%-Mn, 99.99at.%-Ni, and 99.99at.%-Ga as the target material, and put the target material into the vacuum non- In the consumable electrode electric arc furnace, the furnace cavity is evacuated before smelting, and the vacuum degree reaches 5×10 -3 Pa, filled with Ar protective gas. In order to make the composition of the material uniform, the material is turned over by a manipulator before each smelting, and the smelting is turned over at least 4 times, and magnetic stirring is added during the smelting process. After smelting, an ingot with a diameter of about 50mm is obtained. After being ground on the grinding wheel, the ingot was placed on a wire electric discharge machine and cut into a circular target with a diameter of 3mm×2mm. Quartz glass with a specification of 30mm×30mm×3mm is selected as the substrate of the thin film. Pretreatment of the glass substrate: wash the glass substrate with deionized wate...
Embodiment 2
[0026] Take three kinds of metal elements with purity of 99.95at.%-Mn, 99.99at.%-Ni, and 99.99at.%-Ga as the target material, and put the target material into the vacuum non- In the consumable electrode electric arc furnace, the furnace cavity is evacuated before smelting, and the vacuum degree reaches 5×10 -3 Pa, filled with Ar protective gas. In order to make the composition of the material uniform, the material is turned over by a manipulator before each smelting, and the smelting is turned over at least 4 times, and magnetic stirring is added during the smelting process. After smelting, an ingot with a diameter of about 50 mm is obtained. After being ground on the grinding wheel, the ingot was placed on a wire electric discharge machine and cut into a circular target with a diameter of 3mm×2mm. Quartz glass with a specification of 30mm×30mm×3mm is selected as the substrate of the thin film. Pretreatment of the glass substrate: wash the glass substrate with deionized wat...
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