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Method for preparing WS2/Ag compositional gradient solid lubrication film

A solid lubrication and manufacturing method technology, applied in ion implantation plating, metal material coating process, coating, etc., can solve the problems of easy oxidation failure of the film, increase of friction coefficient, etc., achieve excellent wear resistance and improve film performance Effect

Active Publication Date: 2015-10-07
BEIJING RES INST OF AUTOMATION FOR MACHINERY IND
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the present invention is to provide a method for preparing anti-friction WS using ion beam assisted deposition (IBAD) technology. 2 / Ag compound gradient solid lubricating film method, used to solve the friction coefficient rise of this type of film in the prior art under humid environment, single WS 2 The problem of easy oxidation failure of thin film

Method used

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  • Method for preparing WS2/Ag compositional gradient solid lubrication film
  • Method for preparing WS2/Ag compositional gradient solid lubrication film
  • Method for preparing WS2/Ag compositional gradient solid lubrication film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0069] Put the substrate 1 on the sample stage of the vacuum chamber 10, and evacuate the vacuum chamber 10 to a vacuum degree of 3.0×10 -4Pa~1.8×10 -3 Pa, filled with argon with a purity of 99.99%. After cleaning the surface of the substrate 1 with a low-energy ion source 20, WS was prepared by alternating ion bombardment and magnetron sputtering. 2 / Ag composite gradient solid lubricating film, first perform ion recoil implantation, then sputter deposition, and cycle 40 times in sequence.

[0070] Ion recoil implantation can use MEVVA metal ion source, and the ion source uses a silver target with a purity of 99.8%. During ion recoil injection, the residence time of the substrate in front of the target was 4min, and the ion source voltage was 45kV.

[0071] Unbalanced magnetron sputtering using WS 2 target. During sputtering deposition, the residence time of the substrate in front of the target is 90s, the sputtering voltage is 700V-900V, the sputtering current is 1A-2A,...

Embodiment 2

[0073] Put the substrate 1 on the sample stage of the vacuum chamber 10, and evacuate the vacuum chamber 10 to a vacuum degree of 3.0×10 -4 Pa~1.8×10 -3 Pa, filled with argon with a purity of 99.99%. After cleaning the surface of the substrate 1 with a low-energy ion source 20, WS is prepared by alternately performing ion recoil implantation and magnetron sputtering. 2 / Ag composite gradient solid lubricating film, the first ion recoil implantation, and then sputtering deposition, followed by 6 cycles.

[0074] The ion recoil implantation adopts MEVVA metal ion source 40, and the ion source adopts a silver target with a purity of 99.8%. During ion recoil injection, the residence time of the substrate in front of the target was 3 min, and the ion source voltage decreased sequentially. The Ag ion source voltage for the first ion recoil injection is 60-80kV, the second Ag ion source voltage is 50-60kV, the third Ag ion source voltage is 40-50kV, and the fourth Ag ion source vo...

Embodiment 3

[0077] Put the substrate 1 on the sample stage of the vacuum chamber 10, and evacuate the vacuum chamber 10 to a vacuum degree of 3.0×10 -4 Pa~1.8×10 -3 Pa, filled with argon with a purity of 99.99%. After cleaning the surface of the substrate 1 with a low-energy ion source 20, WS is prepared by alternately performing ion recoil implantation and magnetron sputtering. 2 / Ag composite gradient solid lubricating film, first perform ion recoil implantation, then sputter deposition, and cycle 5 times in sequence.

[0078] The ion recoil implantation adopts MEVVA metal ion source 40, and the ion source adopts a silver target with a purity of 99.8%. During ion recoil implantation, the ion source voltage is 55kV, the ion source current is 15mA, and the residence time of the substrate 1 in front of the target decreases successively. The first ion recoil injection time is 3-10 minutes, the second injection time is 3-8 minutes, the third injection time is 2-6 minutes, the fourth injec...

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Abstract

The invention discloses a method for preparing a WS2 / Ag compositional gradient solid lubrication film. The WS2 / Ag compositional gradient solid lubrication film is formed on the surface of a base material in an ion beam assisted deposition method. The method for preparing the WS2 / Ag compositional gradient solid lubrication film includes the steps that the baser material is preprocessed; the solid lubrication film is generated, the base material is put into a vacuum chamber, and vacuum pumping is conducted; surface modification is conducted on the base material through a low-energy ion source and a high-energy ion source in an alternate mode, so that the WS2 / Ag compositional gradient solid lubrication film is generated on the surface of the base material, and the proportion of W to S in the WS2 / Ag compositional gradient solid lubrication film is 1:0.8; and the base material with the WS2 / Ag compositional gradient solid lubrication film generated on the surface is put into an acetone solution to be cleaned and the dried, and the dried base material is sealed and stored in a vacuum mode.

Description

technical field [0001] The invention relates to the manufacture of a solid lubricating film, in particular to a method of manufacturing anti-friction WS using ion beam assisted deposition technology. 2 / Ag composite gradient solid lubricant film manufacturing method. Background technique [0002] WS 2 Lubricating film is the main research direction in the field of solid lubrication at home and abroad. It has a very low friction coefficient, high extreme pressure resistance, and oxidation resistance than MoS 2 Even better, it is suitable for harsh conditions such as high temperature, high pressure, high vacuum, high load, high speed, high radiation, strong corrosion, and ultra-low temperature. The United States took the lead in applying it to military fields such as space shuttles, fighter jets, and chain drives for military machinery. At the same time, it also applied it to hard disk drive bearings for computers, and rotating and sliding components in ultra-high vacuum sys...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/35
Inventor 金杰邱维维王月朱政
Owner BEIJING RES INST OF AUTOMATION FOR MACHINERY IND
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