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Method for preparing nano-microporous polymer thin-film material

A polymer film and nano-micropore technology, which is applied in the field of surface materials, can solve the problems of high structural requirements, unstable structure and high cost, and achieve the effects of strong mechanical and physical properties, convenient operation and stable performance.

Active Publication Date: 2015-11-04
TECHNICAL INST OF PHYSICS & CHEMISTRY - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For example, the synthesis of asymmetric amphiphilic block copolymers is to use the mutual insolubility of different blocks to generate phase separation in the solid film to produce fine aggregates of different shapes, and further to obtain nano-sized micro-aggregates through different processing methods. Pore ​​structure (EJW Cross land et al, Soft Matter, 2007, 3, 94-98); however, this method is costly and requires high structure
Rubner developed a method using L-B-L, by alternately assembling cationic polyelectrolytes and anionic polyelectrolytes into multilayer membranes, and then processing them in aqueous solution to obtain nanoporous membrane materials (JD Mendelsohn, Langmuir2000, 16, 5017-5023); however , the structure generated by electrostatic or hydrogen bond interaction is unstable, and it is easily deteriorated by the influence of the environment

Method used

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  • Method for preparing nano-microporous polymer thin-film material
  • Method for preparing nano-microporous polymer thin-film material
  • Method for preparing nano-microporous polymer thin-film material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0049] 1) Take a copolymer of sodium acrylate and acrylamide, prepare it into an aqueous solution, stir at room temperature for 1 hour, then add glutaraldehyde whose mass is 3% of the polymer mass, and continue stirring for 1 hour to obtain a coating solution.

[0050] 2) Clean the substrate used, such as a silicon wafer, after H 2 o 2 and H 2 SO 4 (v H2O2 / v H2SO4 =1:3) The mixture was treated at 80°C for 0.5h, rinsed with water, and dried in an oven at 70°C for use.

[0051] 3) The polymer solution was evenly coated on the glass substrate by the method of spin coating.

[0052] 4) Then the coating was cured at 40°C to form a film, and the heating time was 5 hours to obtain a smooth coating with a thickness of about 6 μm.

[0053] 5) Soak the above-mentioned coating in 0.2mol / l sodium chloride solution for 1 hour, after taking it out, wash it with clean water for 30 seconds and then wash it with N 2 Blow drying to obtain the anionic polymer microporous film coating.

...

Embodiment 2

[0057] 1) Take the copolymer of methacrylic acid and acrylamide, prepare it into an aqueous solution, stir at room temperature for 1 hour, then add glutaraldehyde whose mass is 15% of the polymer mass, and continue stirring for 1 hour to obtain a coating solution.

[0058] 2) Clean the substrate used, such as glass, after H 2 o 2 and H 2 SO 4 (v H2O2 / v H2SO4 =1:3) The mixture was treated at 80°C for 0.5h, rinsed with water, and dried in an oven at 70°C for use.

[0059] 3) The polymer solution is uniformly coated on the glass substrate by dip coating.

[0060] 4) Then the coating was cured at 80°C to form a film, and the heating time was 2 hours to obtain a smooth coating with a thickness of about 10 μm.

[0061] 5) Soak the above coating in 2mol / l Na 2 SO 4 After being in the solution for 1 hour, take it out, rinse it with water for 30 seconds, and then dry it in vacuum to obtain an anionic polymer microporous film coating.

[0062] 6) AFM (Bruker Multimodoe8) was u...

Embodiment 3

[0064] 1) Prepare an anionic copolymer of acrylic acid and acrylamide into an aqueous solution, stir at room temperature for 1 h, then add glutaraldehyde whose mass is 10% of the polymer mass, and continue stirring for 1 h to obtain a coating solution.

[0065] 2) Clean the substrate used, such as glass, after H 2 o 2 and H 2 SO 4 (v H2O2 / v H2SO4 =1:3) The mixture was treated at 80°C for 0.5h, rinsed with water, and dried in an oven at 70°C for use.

[0066] 3) The polymer solution is evenly coated on the glass substrate by scraping method.

[0067] 4) Then the coating was cured at 60°C to form a film, and the heating time was 3 hours to obtain a smooth coating with a thickness of about 10 μm.

[0068] 5) Soak the above-mentioned coating in 0.2mol / l KCL solution for 1 hour, take it out, rinse it with clean water for 30 seconds, and then dry it with blower to obtain an anionic polymer microporous film coating.

[0069] 6) AFM was used to observe the surface microstructu...

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Abstract

The invention discloses a preparation method of a nano-microporous polymer thin-film material. According to the method, a polymer solution undergoes film formation and crosslinking so as to obtain a polymer thin-film with a network structure; then, the polymer thin-film undergoes swelling in a processing solution; and finally, drying is carried out to obtain the nano-microporous polymer thin-film. The method is convenient and economical and can be applied at large scale. The prepared nano-microporous thin-film has characteristics of highly rough surface, nanoscale size and uniform and dense distribution.

Description

technical field [0001] The invention belongs to the field of surface materials, in particular to a method for preparing nano-microporous polymer film materials. Background technique [0002] In recent years, microporous polymer film materials, especially microporous film materials with nanometer pore size, have become a research hotspot because of their unique properties and good application prospects. They are widely used in separation and filtration membranes, controllable drugs, catalyst carriers, optical thin films, self-cleaning coatings, templates for material synthesis, tissue engineering scaffolds, and many other aspects. [0003] At present, the preparation methods of microporous polymer film materials can be roughly divided into two categories: top-down (top-down) and bottom-up (bottom-up). Lithography and related technologies are a common method, however, limited by light diffraction, it is usually difficult for lithography equipment to manufacture microporous ma...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08J9/28C08J7/02C08J5/18C08J3/24
Inventor 吴飞鹏魏宁宁王尔鑑汤泽辉
Owner TECHNICAL INST OF PHYSICS & CHEMISTRY - CHINESE ACAD OF SCI
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