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Low-reflectivity silicon wafer texturing agent and preparation method thereof

A low-reflectivity, texturing agent technology, applied in chemical instruments and methods, crystal growth, post-processing details, etc., can solve the problems of large chemical consumption, low reaction controllability, affecting product quality, etc., to achieve product quality. Stable quality, improved texturing efficiency and reduced reflectivity

Inactive Publication Date: 2015-11-25
安徽飞阳能源科技有限公司
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  • Application Information

AI Technical Summary

Problems solved by technology

The isopropanol and other components used in the existing texturing liquid have large volatilization, poor environmental protection, short service life, large chemical consumption, low reaction controllability, and poor texturing repeatability, which directly affect product quality

Method used

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Examples

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Embodiment Construction

[0013] Non-limiting examples of the present invention are as follows:

[0014] A kind of low-reflectivity silicon wafer texturizing agent, is prepared from the component raw material of following weight (kg):

[0015] Sodium Pyrophosphate 0.5, Sodium Hydroxide 2.5, Disodium Laureth Sulfosuccinate 1, Dicarboxymethylalanine Trisodium 0.5, Diethylene Triamine Pentaacetic Acid 0.2, Konjac Gum 0.5, Texturing Regulator 10, Tricaprylic Glyceride 0.4, Water 150;

[0016] Wherein the texturizing regulator is made of the following component raw materials by weight (kg): styrene 3, methyl methacrylate 2, polyvinyl alcohol 2, cornstarch 1, potassium persulfate 0.1, flat plus 0.5, water 80; The preparation method of the texture regulator is to add polyvinyl alcohol and corn starch to 1 / 2 amount of water and stir at 60°C for 1 hour, then add Pingpingjia and stir for 5 minutes at 1000r / min, add styrene, methyl methacrylate and potassium persulfate Mix well and heat to 85°C to react for 0.5...

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PUM

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Abstract

The invention discloses a low-reflectivity silicon wafer texturing agent. The low-reflectivity silicon wafer texturing agent is characterized by being prepared by, by weight, 0.3-0.5 part of sodium pyrophosphate, 1.5-2.5 parts of sodium hydroxide, 0.5-1 part of disodium C-[2-[2-[2-(dodecyloxy)ethoxy]ethoxy]ethyl] sulphonatosuccinate, 0.3-0.5 part of trisodium N-iminodiacetate, 0.1-0.2 part of diethylenetriamine pentaacetic acid, 0.3-0.5 part of konjac glucomannan, 5-10 parts of texturing regulator, 0.2-0.4 part of tricaprylin and 100-150 parts of water. The low-reflectivity silicon wafer texturing agent can improve texturing efficiency and stability of texturing process and can make suede more uniform, lower reflectivity, effectively improve conversion efficiency of cells, improve performance of the cells and is stable in product quality.

Description

technical field [0001] The invention relates to silicon chip texturing technology, in particular to a silicon chip texturing agent with low reflectivity and a preparation method thereof. Background technique [0002] Texturing is an important process in the production process of solar cells. Using the principle of anisotropic corrosion of single crystal silicon by low-concentration alkaline etching solution, a "pyramid" structure is formed on the surface of the silicon wafer to reduce the reflectivity of the silicon wafer surface and increase Absorb light, reduce reflectivity, and improve conversion efficiency of solar cells. At present, the conventional texturing process generally uses sodium hydroxide or potassium hydroxide, and adds a suitable mixed solution of isopropanol and sodium silicate for texturing. The isopropanol and other components used in the existing texturing liquid have large volatilization, poor environmental protection, short service life, large chemica...

Claims

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Application Information

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IPC IPC(8): C30B33/10
Inventor 王泽庆
Owner 安徽飞阳能源科技有限公司
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