Low-reflectivity silicon wafer texturing agent and preparation method thereof

A low-reflectivity, texturing agent technology, applied in chemical instruments and methods, crystal growth, post-processing details, etc., can solve the problems of large chemical consumption, low reaction controllability, affecting product quality, etc., to achieve product quality. Stable quality, improved texturing efficiency and reduced reflectivity

Inactive Publication Date: 2015-11-25
安徽飞阳能源科技有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The isopropanol and other components used in the existing texturing liquid have large volatilization, poor environmental protection, short se

Method used

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Examples

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Example Embodiment

[0013] Non-limiting examples of the present invention are as follows:

[0014] A low-reflectivity silicon wafer texturing agent, prepared from the following components in weight (kg):

[0015] Sodium pyrophosphate 0.5, Sodium hydroxide 2.5, Disodium laureth sulfosuccinate 1, Trisodium dicarboxymethylalanine 0.5, Diethylenetriaminepentaacetic acid 0.2, Konjac gum 0.5, Texturing Conditioner 10, tricaprylin 0.4, water 150;

[0016] Among them, the texturing regulator is made of the following components in weight (kg): styrene 3, methyl methacrylate 2, polyvinyl alcohol 2, corn starch 1, potassium persulfate 0.1, flat addition 0.5, water 80; The preparation method of the texturing regulator is to first add polyvinyl alcohol and corn starch into 1 / 2 amount of water at 60°C and stir for 1 hour, then add it to 1000r / min and stir for 5 minutes, add styrene, methyl methacrylate and potassium persulfate Mix well and heat to 85°C for 0.5h. Finally, add the remaining water, stir well and cool ...

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PUM

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Abstract

The invention discloses a low-reflectivity silicon wafer texturing agent. The low-reflectivity silicon wafer texturing agent is characterized by being prepared by, by weight, 0.3-0.5 part of sodium pyrophosphate, 1.5-2.5 parts of sodium hydroxide, 0.5-1 part of disodium C-[2-[2-[2-(dodecyloxy)ethoxy]ethoxy]ethyl] sulphonatosuccinate, 0.3-0.5 part of trisodium N-iminodiacetate, 0.1-0.2 part of diethylenetriamine pentaacetic acid, 0.3-0.5 part of konjac glucomannan, 5-10 parts of texturing regulator, 0.2-0.4 part of tricaprylin and 100-150 parts of water. The low-reflectivity silicon wafer texturing agent can improve texturing efficiency and stability of texturing process and can make suede more uniform, lower reflectivity, effectively improve conversion efficiency of cells, improve performance of the cells and is stable in product quality.

Description

technical field [0001] The invention relates to silicon chip texturing technology, in particular to a silicon chip texturing agent with low reflectivity and a preparation method thereof. Background technique [0002] Texturing is an important process in the production process of solar cells. Using the principle of anisotropic corrosion of single crystal silicon by low-concentration alkaline etching solution, a "pyramid" structure is formed on the surface of the silicon wafer to reduce the reflectivity of the silicon wafer surface and increase Absorb light, reduce reflectivity, and improve conversion efficiency of solar cells. At present, the conventional texturing process generally uses sodium hydroxide or potassium hydroxide, and adds a suitable mixed solution of isopropanol and sodium silicate for texturing. The isopropanol and other components used in the existing texturing liquid have large volatilization, poor environmental protection, short service life, large chemica...

Claims

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Application Information

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IPC IPC(8): C30B33/10
Inventor 王泽庆
Owner 安徽飞阳能源科技有限公司
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