Low-residue monocrystalline silicon slice texturing solution and preparation method thereof

A single-crystal silicon wafer, low-residue technology, applied in chemical instruments and methods, crystal growth, post-processing details, etc., can solve the problems of easy volatilization of IPA, adverse environmental effects, human body hazards, etc., to improve product quality, enhance Anisotropic, less residual effect

Inactive Publication Date: 2015-12-09
CHINALAND SOLAR ENERGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

IPA is quite toxic and harmful to the human body. At the same time, IPA is easy to volatilize in the process of making wool and has adverse effects on the environment.

Method used

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Examples

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Embodiment Construction

[0015] Non-limiting examples of the present invention are as follows:

[0016] A low-residue monocrystalline silicon wafer texturing solution is prepared from the following component raw materials by weight (kg):

[0017] Sodium hydroxide 0.5, additive 3, sodium petroleum sulfonate 0.3, potassium sodium tartrate 2, sorbitol 3, nonylphenol polyoxyethylene ether 0.3, sodium dioctyl sulfosuccinate 0.2, hydroxypropyl starch ether 0.2 , water 80;

[0018] Among them, the auxiliary agent is made of the following raw materials by weight (kg): saponin 10, nano-titanium dioxide 0.1, ammonium persulfate 0.1, vinyl acetate 1, sodium bicarbonate 0.2, dodecyl glucoside 1, water 100; The preparation method of the agent is to grind the saponins into powder, add the obtained saponins powder, sodium bicarbonate and lauryl glucoside into water at 80°C and 200r / min and stir for 4h, filter after cooling, and add acetic acid to the filtrate Vinyl ester and nano-titanium dioxide were dispersed ul...

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PUM

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Abstract

The invention discloses a low-residue monocrystalline silicon slice texturing solution which is characterized by being prepared from the following raw materials in parts by weight: 0.5-1 part of sodium hydroxide, 3-5 parts of an auxiliary agent, 0.3-0.5 part of petroleum sodium sulfonate, 2-4 parts of potassium sodium tartrate, 3-5 parts of sorbitol, 0.3-0.5 part of nonylphenol polyoxyethylene ether, 0.2-0.4 part of dioctyl sodium sulfosuccinate, 0.2-0.4 part of hydroxypropyl starch ether, and 80-100 parts of water. The texturing solution improves the consistency and repeatability of a texturing technology, increases the textured surface density, thereby increasing the efficiency of solar cells and improving the quality of the product; the texturing solution does not contain IPA, is beneficial to environmental protection and human health, and is safe and environmentally friendly; and silicon slice surface residues are less in amount and easy to remove, and do not affect the surface processing and product performance of the silicon slice.

Description

technical field [0001] The invention relates to silicon wafer texturing technology, in particular to a low-residue monocrystalline silicon wafer texturing liquid and a preparation method thereof. Background technique [0002] With the increasingly serious energy crisis, solar energy has become the most potential alternative energy in the future, and the solar cell industry is developing rapidly. One of the problems restricting its development is how to improve the photoelectric conversion efficiency of solar cells and reduce costs. Among them, the texturing process is an important step to improve the photoelectric conversion efficiency. [0003] Texturing is also called "surface texturing". The effective textured structure makes the incident light reflect and refract multiple times on the surface of the silicon wafer, which increases the light absorption and reduces the reflectivity, which helps to improve the performance of the battery. The chemical etching method is most...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B33/10
Inventor 郭万东孟祥法董培才陈伏洲
Owner CHINALAND SOLAR ENERGY
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