Low-residue monocrystalline silicon slice texturing solution and preparation method thereof
A single-crystal silicon wafer, low-residue technology, applied in chemical instruments and methods, crystal growth, post-processing details, etc., can solve the problems of easy volatilization of IPA, adverse environmental effects, human body hazards, etc., to improve product quality, enhance Anisotropic, less residual effect
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[0015] Non-limiting examples of the present invention are as follows:
[0016] A low-residue monocrystalline silicon wafer texturing solution is prepared from the following component raw materials by weight (kg):
[0017] Sodium hydroxide 0.5, additive 3, sodium petroleum sulfonate 0.3, potassium sodium tartrate 2, sorbitol 3, nonylphenol polyoxyethylene ether 0.3, sodium dioctyl sulfosuccinate 0.2, hydroxypropyl starch ether 0.2 , water 80;
[0018] Among them, the auxiliary agent is made of the following raw materials by weight (kg): saponin 10, nano-titanium dioxide 0.1, ammonium persulfate 0.1, vinyl acetate 1, sodium bicarbonate 0.2, dodecyl glucoside 1, water 100; The preparation method of the agent is to grind the saponins into powder, add the obtained saponins powder, sodium bicarbonate and lauryl glucoside into water at 80°C and 200r / min and stir for 4h, filter after cooling, and add acetic acid to the filtrate Vinyl ester and nano-titanium dioxide were dispersed ul...
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