Thermal evaporation method for preparation of near-stoichiometric CdS film with quantum dot as precursor
A stoichiometric and thermal evaporation technology, applied in the field of material chemistry, can solve problems such as increasing complexity, and achieve the effects of simple method, reduction of preparation steps, and simplification of preparation process
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[0031] 1. Preparation:
[0032] (1) Configuration solution: 75mL, 0.125M nitric acid, Cd(NO3)2·4H2O aqueous solution and sodium sulfide Na2S aqueous solution;
[0033] (2) Clean the substrate: select indium tin oxide (ITO) conductive glass as the substrate. First, the conductive ITO / glass substrate was cleaned with deionized water containing detergent to preliminarily remove oil stains and dust on the substrate surface. After this process was carried out with the assistance of ultrasound for 30 minutes, it was cleaned with deionized water and ultrasonically cleaned for 10 minutes, and then replaced with new deionized water for 10 minutes, and the cycle was repeated 3 times. Then, the substrate is boiled in a mixed solution of ammonia (NH3·H2O), hydrogen peroxide (H2O2) and deionized water at a volume ratio of 1:2:5 at 80oC until no bubbles are generated to remove all residual organic contamination . Afterwards, wash with deionized water and ultrasonically clean for 10 minut...
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