Medical porous tantalum metal material and preparation method thereof

A metal material and porous tantalum technology, applied in metal material coating technology, medical science, gaseous chemical plating, etc., can solve problems such as limited thickness of tantalum plating coating, lower mechanical properties of products, uneven pore size, etc., to achieve The effect of uniform pores, low density and simple preparation method

Active Publication Date: 2015-12-23
伟坦(大连)生物材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, due to the high melting point of tantalum, the traditional powder loose sintering method is difficult to process, and the porosity of the prepared material is low, the pore size is uneven and the closed porosity is high.
The method of chemical vapor deposition is a feasible method to prepare porous tantalum metal, but the thickness of tantalum coating is usually limited, which reduces the mechanical properties of the product; moreover, this method puts forward higher requirements on the physical and biological properties of the framework material, namely The framework material itself is required to have high temperature resistance, mechanical properties compatible with the implantation environment, and no cytotoxicity

Method used

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  • Medical porous tantalum metal material and preparation method thereof
  • Medical porous tantalum metal material and preparation method thereof

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Embodiment 1

[0032] A preparation of a medical porous tantalum metal material, comprising the steps of:

[0033] (1) Use 40% HF: 68% HNO to the porous silicon carbide support with a porosity of 85% and a pore diameter of 500 μm 3 :H 2 O=1:5:6 mixed solution is cleaned by ultrasonic vibration, blown dry with dry nitrogen, and placed in a vapor deposition reaction chamber;

[0034] (2) Connect the inlet / exhaust pipeline device, check the sealing condition of the reaction chamber, evacuate, and then heat to 950°C under the protection of argon;

[0035] (3) Put the carbon pentachloride powder with a particle size of 400 mesh into the source tank, heat it to 200°C, and use high-temperature argon (300°C) as the carrier gas to pass into the reaction chamber, and the flow rate of the carrier gas is 120ml / min , the temperature of the reaction chamber is 950°C, and the vacuum degree of the reaction chamber is 10Pa; while the tantalum pentachloride powder is passed into the reaction chamber with ar...

Embodiment 2

[0039] A preparation of a medical porous tantalum metal material, comprising the steps of:

[0040] (1) Use 40% HF: 68% HNO to the porous silicon carbide scaffold with a porosity of 85% and a pore diameter of 400 μm 3 :H 2 O=1:5:6 mixed solution is cleaned by ultrasonic vibration, blown dry with dry nitrogen, and placed in a vapor deposition reaction chamber;

[0041] (2) Connect the inlet / exhaust pipeline device, check the seal of the reaction chamber, evacuate, and then heat to 1050°C under the protection of argon;

[0042] (3) Put the carbon pentachloride powder with a particle size of 400 mesh into the source tank, heat it to 250°C, and use high-temperature argon (300°C) as the carrier gas to pass into the reaction chamber, and the flow rate of the carrier gas is 120ml / min , the temperature of the reaction chamber is 1050°C, and the vacuum degree of the reaction chamber is 15Pa; while the tantalum pentachloride powder is passed into the reaction chamber with argon as the...

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Abstract

The invention discloses a medical porous tantalum metal material and a preparation method thereof. The medical porous tantalum metal material is prepared through the steps that through a chemical vapor deposition method, tantalum metal compounds are reduced to tantalum metal powder, the tantalum metal powder is evenly deposited on the surface of a porous silicon support to form a tantalum coating, and then the medical porous tantalum metal material is prepared, wherein one of tantalum pentachloride and fluoride tantalum is adopted as the tantalum metal compounds, the porosity of the porous silicon support is larger than 70 percent, the pore diameter of the porous silicon support is 100-600 micrometers, and the thickness of the tantalum coating is 10-50 micrometers. According to the medical porous tantalum metal material and the preparation method thereof, the porous tantalum metal material is of a communicated porous structure, is high in porosity, uniform in pore, few in pore dead space and similar to the cancellous bones of a human body and can promote bone ingrowth and be applied to bone defect repair after bone trauma and osteonecrosis of multiple portions in the human body occur.

Description

technical field [0001] The invention relates to a medical porous metal material and a preparation method thereof, in particular to a medical porous tantalum metal material applicable to orthopedic load-bearing parts and a preparation method thereof. Background technique [0002] The repair of bone defects after bone trauma and necrosis has problems of poor mechanical and osteoinductive properties. After the importance of porous materials in vivo is revealed, this problem is expected to be better resolved. Studies have found that the porosity and pore size of porous materials are important factors in determining the success of implants, and increasing the porosity or reducing the "dead space" will facilitate bone ingrowth. It is generally believed that the porosity is greater than 60%, and the diameter of the void is greater than 150 μm, which is conducive to bone ingrowth. When the pore size is 200 μm-400 μm, it is most conducive to the growth of new bone. At the same time...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/14
CPCA61F2/28A61F2002/2835A61F2002/3092A61L27/306A61L27/56A61L2430/02C23C16/0227C23C16/045C23C16/14C23C16/4481
Inventor 赵德伟王本杰谢辉黄诗博尉晓蔚王威
Owner 伟坦(大连)生物材料有限公司
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