Trimethyliodosilane preparation method
A technology for trimethyl iodide silane and trimethyl chlorosilane is applied in the field of preparing trimethyl iodide silane, which can solve the problems of many by-products and low yield, and achieve the effects of less impurities, high yield and simple purification.
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[0021] Example 1
[0022] A method for preparing trimethylsilyl iodide, the method comprising the following steps:
[0023] 1) 250ml three-necked flask, equipped with feeding funnel, nitrogen conduit and reflux condenser, turn on nitrogen purge, and add 17.4g of anion exchange resin (201×4(711) strong basic styrene type I anion exchange resin) and 26ml of water (1.4mol) was added to a three-necked flask, stirred, heated to 45°C, added 43.4g (400mmol) of trimethylchlorosilane, added trimethylchlorosilane, heated to 75°C, stirred for 2.5 hours, and distilled at atmospheric pressure. Collect the fractions at 99-100°C, dry with anhydrous sodium sulfate, and filter to obtain 30.5 g of hexamethyldisiloxane with a purity of 99.5% and a yield of 93.8%;
[0024] 2) 250ml three-necked flask, equipment feeding funnel, nitrogen conduit and reflux condenser, turn on nitrogen purge, add step 1) hexamethyldisiloxane 16.2g (100mmol) and aluminum powder 4.9g (180mmol, average particle size is 35μm)...
Example Embodiment
[0025] Example 2
[0026] A method for preparing trimethylsilyl iodide, the method comprising the following steps:
[0027] 1) 250ml three-necked flask, equipment feeding funnel, nitrogen conduit and reflux condenser, open nitrogen purge, add 19.4g anion exchange resin (D201 macroporous strong basic styrene anion exchange resin) and 23ml (1.2mol) water Into a three-necked flask, start stirring, heat up to 45°C, add 43.4g (400mmol) of trimethylchlorosilane, add trimethylchlorosilane, heat up to 70°C, stir for 1.5 hours, distill under normal pressure, collect 99-100°C The distillate was dried with anhydrous sodium sulfate and filtered to obtain 29.8 g of hexamethyldisiloxane with a purity of 99.6% and a yield of 91.7%;
[0028] 2) A 250ml three-necked flask, equipment feeding funnel, nitrogen conduit and reflux condenser, turn on nitrogen purge, add 16.2g (100mmol) of hexamethyldisiloxane and 4g (150mmol, average particle size of 30μm) of aluminum powder, start Magnetically stir, hea...
Example Embodiment
[0029] Example 3
[0030] A method for preparing trimethylsilyl iodide, the method comprising the following steps:
[0031] 1) 250ml three-necked flask, equipped with feeding funnel, nitrogen conduit and reflux condenser, turn on nitrogen purge, add 15.2g of anion exchange resin (303 weakly basic epoxy anion exchange resin) and 30ml (1.6mol) of water to the three-necked flask In the flask, start stirring, heat up to 45°C, add 43.4g (400mmol) of trimethylchlorosilane, add trimethylchlorosilane, heat up to 65°C and stir for 2 hours, distill under normal pressure, collect 99-100°C fractions, Dry with anhydrous sodium sulfate and filter to obtain 29.5 g of hexamethyldisiloxane with a purity of 99.8% and a yield of 90.9%;
[0032] 2) 250ml three-necked flask, equipped with feeding funnel, nitrogen conduit and reflux condenser, turn on nitrogen purge, add 16.2g (100mmol) of hexamethyldisiloxane and 4.3g (160mmol, average particle size of 50μm) of aluminum powder, Start magnetic stirring,...
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