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Method for preparation of lithium-doped cubic-phase SnO2 thin film through low-temperature ultrasonic atomization pyrolysis and deposition

An ultrasonic atomization and cubic phase technology is applied in the field of low-temperature ultrasonic atomization and pyrolysis deposition of lithium-doped cubic phase SnO2 thin films, which can solve problems such as affecting the film formation effect, and achieve the effect of improving electrical and optical properties.

Inactive Publication Date: 2016-02-24
EAST CHINA NORMAL UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Vertically inverted spray can avoid the generation of larger water droplets in the spray, but the atomization and pyrolysis process of the traditional substrate fixture is often dominated by process B, which affects the final film formation effect

Method used

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  • Method for preparation of lithium-doped cubic-phase SnO2 thin film through low-temperature ultrasonic atomization pyrolysis and deposition
  • Method for preparation of lithium-doped cubic-phase SnO2 thin film through low-temperature ultrasonic atomization pyrolysis and deposition
  • Method for preparation of lithium-doped cubic-phase SnO2 thin film through low-temperature ultrasonic atomization pyrolysis and deposition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] a), substrate selection and cleaning

[0029] Soda-lime glass of 20×20 mm was used as the substrate. The substrate was sonicated with ethanol, acetone and deionized water for 20 minutes, and then dried with nitrogen gas for later use.

[0030] b) Configuration of precursor fluid

[0031] First, a certain mass of stannous chloride solid was weighed and dissolved in 100 mL of absolute ethanol and deionized water with a volume ratio of 3:1 to prepare a 0.1 M / L solution. Secondly, weigh a certain mass of lithium chloride solid and add it to the prepared SnCl 2 2H 2 In O solution, Li + with Sn 2+ The molar ratio is 1:50. The solution was placed on a constant temperature magnetic stirrer and stirred for 0.5 h to obtain a stable and clear precursor solution for future use.

[0032] c), spraying

[0033]Set the cleaned substrate in the substrate holder, and use the precursor solution in step b) to carry out ultrasonic atomization and pyrolysis spraying on the substrate....

Embodiment 2

[0035] a) Cleaning of the substrate

[0036] With embodiment 1.

[0037] b) Configuration of precursor fluid

[0038] First, a certain mass of stannous chloride solid was weighed and dissolved in 100 mL of absolute ethanol and deionized water with a volume ratio of 1:1 to prepare a 0.2 M / L solution. Secondly, weigh a certain mass of lithium carbonate solid and add it to the prepared SnCl 2 2H 2 In O solution, Li + with Sn 2+ The molar ratio is 1:50. The prepared solution was placed on a constant temperature magnetic stirrer and stirred for 0.5 h to obtain a stable precursor solution for future use.

[0039] c) Spraying

[0040] Set the cleaned substrate in the substrate holder, and use the precursor solution in step b) to carry out ultrasonic atomization and pyrolysis spraying on the substrate. During the spraying process, the carrier gas is air, and the flow rate is 50mL / min. The distance from the nozzle to the substrate is 1cm, and the substrate temperature is set to...

Embodiment 3

[0042] a) Cleaning of the substrate

[0043] A 20×20 mm glass was used as the substrate. The substrate was sonicated with ethanol, acetone and deionized water for 20 minutes, and then dried with nitrogen gas for later use.

[0044] b) Configuration of precursor fluid

[0045] First, a certain mass of stannous chloride solid was weighed and dissolved in 100 mL of a solvent with a volume ratio of absolute ethanol and deionized water of 1:3 to prepare a 0.05 M / L solution. Secondly, weigh a certain mass of lithium nitrate solid and add it to the prepared SnCl 2 2H 2 In O solution, Li + with Sn 2+ The molar ratio is 1:50. The prepared solution was placed on a constant temperature magnetic stirrer and stirred for 0.5 h to obtain a stable precursor solution for future use.

[0046] c), spraying

[0047] Set the cleaned substrate in the substrate holder, and use the precursor solution in step b) to carry out ultrasonic atomization pyrolytic spraying on the substrate. During th...

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Abstract

The invention discloses a method for preparation of lithium-doped cubic-phase SnO2 thin film through low-temperature ultrasonic atomization pyrolysis and deposition. According to the method, stannous chloride as a solute, anhydrous ethanol and deionized water as a solvent, and inorganic lithium salt as a dopant are mixed to obtain a solution, the solution is placed in an atomization tank, a substrate is arranged in a clamp to be subjected to ultrasonic atomization pyrolysis spray, so as to obtain the SnO2 thin film deposited on the substrate and excellent in transmittance and conductibility. Lithium ions are placed in SnO2 interstitial voids in an interstitial ion manner to provide conduction electrons, so that the concentration of free charge carriers is increased, and the comprehensive performance of the transparent conductive thin film is improved. Through high-frequency ultrasonic wave, atomization of the precursor solution is realized, so that fine and uniform fog can be obtained; through the improvement of the clamp perpendicular to the substrate, temperature required in the preparation process can be reduced, the energy is saved, and a heating platform is protected; through the method, the cubic-phase SnO2 thin film can be prepared under lower pressure and lower temperature.

Description

technical field [0001] The invention belongs to the field of inorganic non-metallic materials, and relates to a low-temperature ultrasonic atomization pyrolytic deposition of lithium-doped cubic phase SnO 2 thin film method. Background technique [0002] In recent years, transparent conductive oxides have been widely used in the fields of thin-film solar cells, flat panel displays, gas sensors, and low-emissivity glass due to their excellent carrier transport properties and high visible light transmittance (≥80%). Applications. The most widely used and mature transparent conductive oxide in the market is tin-doped indium oxide (ITO), but its large-scale application prospects are limited due to the toxicity of In element and the scarcity of raw material sources. Many alternatives to ITO have received increasing attention, such as SnO 2 :F(FTO),SnO 2 :Sb(ATO), [0003] ZnO:Al(AZO) and so on. Among them, SnO 2 Thin film is an ideal transparent conductive material due to ...

Claims

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Application Information

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IPC IPC(8): C03C17/22C03C17/23
Inventor 郭一欣程文娟江锦春左少华石富文褚君浩
Owner EAST CHINA NORMAL UNIV
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