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5results about How to "Improve electricity" patented technology

Preparation method of graphene copper-based composite material

The invention discloses a preparation method of a graphene copper-based composite material, and belongs to the technical field of copper-based composite materials. The method comprises the following steps: (1) carrying out surface pretreatment on a copper foil; (2) dropwise adding the graphene dispersion liquid on the surface of the copper foil, and drying the copper foil after the graphene dispersion liquid is freely diffused until the graphene dispersion liquid covers the surface of the copper foil; (3) stacking the copper foils in a manner that a graphene layer is arranged between two layers of copper foils, and then sequentially carrying out cold pressing and hot pressing to obtain a hot-pressed composite material; (4) annealing the hot-pressed composite material to obtain an annealed composite material; (5) carrying out cold rolling on the annealed composite material to obtain a rolled composite material; and (6) the rolled composite material is subjected to annealing treatment, and the graphene copper-based composite material is obtained. On the basis of simplifying the preparation process and reducing the preparation demand conditions, the graphene is promoted to effectively and fully exert the strengthening effect, and the comprehensive performance of the composite material in multiple aspects is improved.
Owner:KUNMING UNIV OF SCI & TECH +1

A method for fabricating controllable crystallization micron-sized perovskite light-emitting devices based on solution pretreatment

This invention belongs to the field of optoelectronic technology, specifically relating to a method for fabricating a controllable crystallization micron-scale perovskite light-emitting device based on solution pretreatment. The method includes the following steps: Step 1: Obtaining a patterned microporous substrate; Step 2: Pre-wetting and seed layer construction; Step 3: Deposition of the main perovskite layer; Step 4: Slow-release controllable crystallization; The spin-coated wet film is placed in a vapor atmosphere of a good solvent for treatment, followed by thermal annealing to form a perovskite thin film within the patterned micropores; Step 5: Fabrication of a controllable crystallization micron-scale perovskite light-emitting device based on solution pretreatment. This invention, using pre-wetting, seed guidance, slow-release crystallization, and vapor annealing on a patterned microporous substrate, achieves precise control over the entire process of film nucleation and growth kinetics within the confined space of the micropores, thereby achieving high-quality, uniform fabrication of perovskite thin films within micron-scale micropores, and ultimately obtaining a high-performance, highly uniform microarray perovskite light-emitting device.
Owner:NINGBO INST OF NORTHWESTERN POLYTECHNICAL UNIV

A method for preparing a high-fidelity photoresist pattern

PendingCN122592751AExactly copy a designControl the rate of chemical reactionsEngineeringSpin speed
The application belongs to the technical field of semiconductor manufacturing, and discloses a preparation method of a high-fidelity photoresist pattern. The method comprises the steps of spin coating, pre-baking, exposure, post-exposure baking and development. The development step comprises: applying a developing solution to the surface of a substrate at a first rotation speed to preliminarily develop the photoresist; adjusting the substrate to a second rotation speed, which is lower than the first rotation speed, to partially remove the developing solution; applying the developing solution to the surface of the substrate while the substrate is in a stationary state, and performing main development while the substrate is kept in the stationary state; and again applying the developing solution to the surface of the substrate while the substrate is in a stationary state, and performing supplementary development while the substrate is kept in the stationary state. The application solves the problems of pattern distortion and shrinkage in the traditional process by using a segmented development process, improves the fidelity and process stability of the photoresist pattern, and has good industrial application value without the need to increase special materials or complex equipment.
Owner:ANHUI LIANGXIN OPTOELECTRONICS TECHNOLOGY CO LTD

Method for connecting skutterudite thermoelectric material and electrode by using Al-containing high-entropy alloy barrier layer

The invention discloses a method for connecting a skutterudite thermoelectric material and an electrode by using a novel Al-containing high-entropy alloy diffusion barrier layer, and relates to the design and preparation of the diffusion barrier layer and the method for connecting the skutterudite thermoelectric material and the electrode. The method aims at solving the problems that diffusion cavities are huge due to unbalanced diffusion in a connector interface obtained through an existing skutterudite thermoelectric material welding method, and consequently a connecting connector is difficult to consider heat stability, interface resistance and mechanical performance at the same time. The method comprises the following steps: 1, cleaning a skutterudite thermoelectric material and an electrode; 2, preparing a diffusion barrier layer by using an electric arc melting or high-energy ball milling or rapid solidification method, and carrying out diffusion welding or brazing; and the diffusion barrier layer is made of an Al-Co-Cr-Fe-Ni system. The joint obtained by utilizing the novel Al-containing high-entropy alloy diffusion barrier layer can simultaneously have extremely low contact resistance, extremely high thermal stability and excellent mechanical properties. The method is suitable for connecting the skutterudite thermoelectric material and the electrode.
Owner:XIANGTAN UNIV

Method for preparing high-conductivity and high-toughness carbon nanotube fiber through vacuum sealing and two-phase region normal-pressure ferric trichloride nondestructive doping

ActiveCN119571606AIncrease the carrier concentrationImprove electrical performancePhysical treatmentFiberSurface charges
The invention relates to the field of preparation of high-performance carbon nanotube fibers, in particular to a method for preparing high-conductivity and high-toughness carbon nanotube fibers through vacuum sealing and two-phase region normal-pressure ferric trichloride nondestructive doping. Carbon nano tube fibers are used as raw materials, and a normal-pressure double-phase region heating method is adopted, so that controllable doping of ferric trichloride molecules among carbon nano tubes and in tube cavities is realized on the premise that intrinsic structures of the carbon nano tubes are not damaged; through surface charge transfer between ferric trichloride molecules and the carbon nanotubes and the action of the ferric trichloride molecules and the tube walls of the carbon nanotubes, the electrical and mechanical properties of the carbon nanotube fibers are greatly improved. According to the method, stable and controllable doping of ferric trichloride is realized while the structural integrity of the carbon nanotubes is maintained, the electrical and mechanical properties of the carbon nanotube fibers are improved, and the method is expected to be applied to the fields of wearable electronic equipment, aerospace and the like.
Owner:INST OF METAL RESEARCH - CHINESE ACAD OF SCI