3results about How to "Improve electricity" patented technology

The invention discloses a preparation method of a graphene copper-based composite material, and belongs to the technical field of copper-based composite materials. The method comprises the following steps: (1) carrying out surface pretreatment on a copper foil; (2) dropwise adding the graphene dispersion liquid on the surface of the copper foil, and drying the copper foil after the graphene dispersion liquid is freely diffused until the graphene dispersion liquid covers the surface of the copper foil; (3) stacking the copper foils in a manner that a graphene layer is arranged between two layers of copper foils, and then sequentially carrying out cold pressing and hot pressing to obtain a hot-pressed composite material; (4) annealing the hot-pressed composite material to obtain an annealed composite material; (5) carrying out cold rolling on the annealed composite material to obtain a rolled composite material; and (6) the rolled composite material is subjected to annealing treatment, and the graphene copper-based composite material is obtained. On the basis of simplifying the preparation process and reducing the preparation demand conditions, the graphene is promoted to effectively and fully exert the strengthening effect, and the comprehensive performance of the composite material in multiple aspects is improved.

This invention belongs to the field of optoelectronic technology, specifically relating to a method for fabricating a controllable crystallization micron-scale perovskite light-emitting device based on solution pretreatment. The method includes the following steps: Step 1: Obtaining a patterned microporous substrate; Step 2: Pre-wetting and seed layer construction; Step 3: Deposition of the main perovskite layer; Step 4: Slow-release controllable crystallization; The spin-coated wet film is placed in a vapor atmosphere of a good solvent for treatment, followed by thermal annealing to form a perovskite thin film within the patterned micropores; Step 5: Fabrication of a controllable crystallization micron-scale perovskite light-emitting device based on solution pretreatment. This invention, using pre-wetting, seed guidance, slow-release crystallization, and vapor annealing on a patterned microporous substrate, achieves precise control over the entire process of film nucleation and growth kinetics within the confined space of the micropores, thereby achieving high-quality, uniform fabrication of perovskite thin films within micron-scale micropores, and ultimately obtaining a high-performance, highly uniform microarray perovskite light-emitting device.

The application belongs to the technical field of semiconductor manufacturing, and discloses a preparation method of a high-fidelity photoresist pattern. The method comprises the steps of spin coating, pre-baking, exposure, post-exposure baking and development. The development step comprises: applying a developing solution to the surface of a substrate at a first rotation speed to preliminarily develop the photoresist; adjusting the substrate to a second rotation speed, which is lower than the first rotation speed, to partially remove the developing solution; applying the developing solution to the surface of the substrate while the substrate is in a stationary state, and performing main development while the substrate is kept in the stationary state; and again applying the developing solution to the surface of the substrate while the substrate is in a stationary state, and performing supplementary development while the substrate is kept in the stationary state. The application solves the problems of pattern distortion and shrinkage in the traditional process by using a segmented development process, improves the fidelity and process stability of the photoresist pattern, and has good industrial application value without the need to increase special materials or complex equipment.