A kind of mems device and its preparation method, electronic device
A device and confinement layer technology, which is applied in the field of MEMS devices and its preparation, can solve the problems of destroying the structure of the oscillating film, affecting the movement of the device, and breaking the oscillating film, so as to reduce the cracking phenomenon, improve the life and reliability, and improve the yield. Effect
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Embodiment 1
[0059] In order to solve the problems existing in the prior art, the present invention provides a kind of preparation method of MEMS device, below in conjunction with attached Figure 2a-2h The method is described further.
[0060] First, step 201 is performed to provide a substrate 201 and form a first sacrificial material layer 202 on the substrate 201 .
[0061] Specifically, such as Figure 2a As shown, wherein the base 201 includes at least a semiconductor substrate, and the semiconductor substrate may be at least one of the materials mentioned below: silicon, silicon-on-insulator (SOI), silicon-on-insulator (SSOI), Silicon germanium on insulator (S-SiGeOI), silicon germanium on insulator (SiGeOI) and germanium on insulator (GeOI) are laminated. Active regions may be defined on the semiconductor substrate.
[0062] A first sacrificial material layer 202 is deposited on the substrate, wherein the first sacrificial material layer 202 can be selected to have a relatively ...
Embodiment 2
[0110] The present invention also provides a MEMS device, such as Figure 2h As shown, the MEMS device includes:
[0111] a stack of vibrating membranes, the stack of vibrating membranes comprising a first vibrating membrane and a second vibrating membrane positioned above the first vibrating membrane;
[0112] The fixed plate 206, including several parts spaced apart from each other, is located above the vibrating film stack;
[0113] The cavity is located between the stack of vibrating membranes and the fixed plate 206 .
[0114] Optionally, the first oscillating film and the second oscillating film are made of the same material.
[0115] The first oscillating film and the second oscillating film are made of polysilicon.
[0116] The MEMS device further includes a barrier located at the top of the cavity, above the stack of oscillating membranes.
[0117] The MEMS device further includes a sensing opening located under the oscillating membrane stack for realizing pressur...
Embodiment 3
[0120] The present invention also provides an electronic device, including the MEMS device described in Embodiment 2. Wherein, the semiconductor device is the MEMS device described in Example 2, or the MEMS device obtained according to the preparation method described in Example 1.
[0121] The electronic device of this embodiment can be any electronic product or equipment such as mobile phone, tablet computer, notebook computer, netbook, game console, TV set, VCD, DVD, navigator, camera, video recorder, voice recorder, MP3, MP4, PSP, etc. , can also be any intermediate product including the MEMS device. The electronic device of the embodiment of the present invention has better performance due to the use of the above-mentioned MEMS device.
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