Manufacture method of self-cleaning fabric

A self-cleaning, fabric technology, applied in the manufacture of rayon, conjugated rayon, knitting, etc., can solve the problem of high difficulty coefficient, and achieve the effect of increasing service life, significant social and economic benefits, and good stability

Active Publication Date: 2016-05-11
东台市天地经纬织品有限公司
View PDF8 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, it is more difficult to unify the dual functions of antifouling and easy decontamination on the same finishing agent, and it has good stability.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] A preparation method for a self-cleaning fabric, which is made from the following raw materials in parts by weight:

[0037] PVC 70,

[0038] Polyoxyethylene-polyoxypropylene block copolymer 20,

[0039] Epoxy 11,

[0040] Nano Titanium Dioxide 4,

[0041] Disodium hydrogen phosphate dodecahydrate 3,

[0042] polystyrene sulfonate 2,

[0043] cellulose ester 3,

[0044] Butylbenzyl phthalate 5,

[0045] Barium Stearate 1,

[0046] loofah juice 10,

[0047] Nano mica powder 0.5,

[0048] Defoamer 0.2,

[0049] Nano Chitin 0.8,

[0050] Coco Betaine 1,

[0051] emulsifying wetting agent 0.3,

[0052] Sodium Alginate 2,

[0053] Glycerin rosin ester 0.4;

[0054] Mix polyvinyl chloride, polyoxyethylene-polyoxypropylene block copolymer, epoxy resin, nano-titanium dioxide, loofah juice, nano-mica powder, polystyrene sulfonate, heat into a molten state, add phthalic acid Butyl benzyl ester, cellulose ester, nano-chitin and other components are mixed to obtain a...

Embodiment 2

[0056] A preparation method for a self-cleaning fabric, which is made from the following raw materials in parts by weight:

[0057] PVC 85,

[0058] Polyoxyethylene-polyoxypropylene block copolymer 33,

[0059] Epoxy 16,

[0060] Nano Titanium Dioxide 10,

[0061] Disodium hydrogen phosphate dodecahydrate 5,

[0062] polystyrene sulfonate 6,

[0063] Cellulose esters 10,

[0064] Butylbenzyl phthalate 15,

[0065] Barium Stearate 5,

[0066] Loofah juice 20,

[0067] Nano mica powder 3,

[0068] Defoamer 0.5,

[0069] Nano Chitin 1.5,

[0070] Coco Betaine 2,

[0071] emulsifying wetting agent 1,

[0072] Sodium Alginate 3,

[0073] Glycerol rosin ester 2;

[0074]Mix polyvinyl chloride, polyoxyethylene-polyoxypropylene block copolymer, epoxy resin, nano-titanium dioxide, loofah juice, nano-mica powder, polystyrene sulfonate, heat into a molten state, add phthalic acid Butyl benzyl ester, cellulose ester, nano-chitin and other components are mixed to obtain a mo...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
particle diameteraaaaaaaaaa
Login to view more

Abstract

The invention relates to a manufacture method of a self-cleaning fabric. The manufacture method comprises the following steps: uniformly mixing polyvinyl chloride, polyoxyethylene-polyoxypropylene block copolymer, epoxy resin, nanometer titania, towel gourd juice, nanometer mica powder and polystyrolsulfon acid, heating to a molten state, adding benzyl butyl phthalate, cellulose ester, nanometer chitin and residual components, uniformly mixing to obtain a modified spinning melt, performing spinning and postprocessing to obtain ultrafine denier fibers, and spinning the spinning fibers to obtain the self-cleaning fabric. By virtue of blending spinning of the combined materials, a hierarchical structure combining a micron structure with a nanometer structure is formed on the surface of the fabric, so that the surface roughness of the fabric is enhanced, and the self-cleaning property and the water and oil repellent performance of the fabric are improved greatly.

Description

technical field [0001] The invention relates to a method for self-cleaning finishing of fiber products, in particular to a method for preparing self-cleaning fabrics. Background technique [0002] Dirt on fabrics includes water-soluble dirt, oily dirt, and dust. Water-soluble dirt and oily dirt are caused by the contact between clothing and human body, or contamination caused by foreign oil (food oil or machine oil, etc.); dust is mainly generated by electrostatic action. Antifouling and easy decontamination are two different concepts, and there is an intrinsic connection between the two. Textiles will be stained gradually during use. Antifouling means that clothing textiles will not be stained by water-based dirt and oily dirt during use, and will not absorb dry dust or particles on fibers or fibers due to static electricity. fabric surface. Finishes that impart stain-repellent properties to textiles are known as stain-repellent finishes. [0003] Easy decontamination m...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): D01F8/10D01F8/16D01F1/10
CPCD01D5/098D01D5/253D01F1/10D01F8/10D01F8/16D01F8/18D04B1/16
Inventor 骆佳豪
Owner 东台市天地经纬织品有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap