Manufacturing method of gallium nitride based heterojunction gas sensitive sensor
A technology of a gas sensor and a production method, which is applied in the field of production of a gallium nitride-based heterojunction gas sensor, and can solve the problems of limitation of two-dimensional electron gas confinement, current drop, and difficulty in production.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0010] see figure 1 As shown, the present invention has invented a method for manufacturing a GaN-based heterojunction gas sensor, which includes:
[0011] (1) select a substrate 10; the material of the substrate 10 is sapphire or silicon or silicon carbide or GaLiO 3 , ZnO;
[0012] (2) A layer of low-temperature gallium nitride nucleation layer 20 is grown on the substrate by metal-organic chemical vapor deposition. The growth temperature of the low-temperature gallium nitride nucleation layer 20 is between 500° C. and 600° C. 5.33×10 4 ~8.0×10 4 Pa, the growth thickness is 0.01~0.06μm;
[0013] (3) Increase the temperature of the substrate 10, and grow the non-intentionally doped GaN high-resistance layer 30 on the low-temperature GaN nucleation layer 20, and the growth temperature of the non-intentionally doped GaN high-resistance layer 30 is 1000 ~1100℃, the growth pressure is 1.33×10 4 ~4.0×10 4 Pa, the growth thickness is 1-5 μm;
[0014] (4) Change the growth c...
PUM
| Property | Measurement | Unit |
|---|---|---|
| temperature | aaaaa | aaaaa |
| pressure | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 