Film structure of reflective 0.532μm and 1.064μm, transparent 0.6μm-0.9μm spectral spectroscopic film
A technology of film structure and spectroscopic film, which is applied in optics, optical filters, optical components, etc., can solve the problems of not considering the angle of incidence of light bands, applicability limitations, and lack of wide application, so as to reduce and control wavelength drift risk, improve coating efficiency, and shorten the production cycle
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Embodiment 1
[0023] Example 1: The light is incident at an oblique angle of 15°, the transparent substrate adopts typical crown glass K9 glass, and the film structure is Glass|(2 / 3TiO 2 4 / 3SiO2 2 ) 12 |Air, high refractive index material titanium dioxide (TiO 2) and silicon dioxide are alternately superimposed on two thin film materials. Wherein, the first film layer is non-extreme titanium dioxide plated on the surface of the K9 glass substrate; the second film layer is silicon dioxide, plated on the first film layer; the third film layer is Titanium dioxide, plated on the second film layer; the fourth film layer is silicon dioxide, and plated on the third film layer; ..., titanium dioxide and silicon dioxide film layers alternate to non-extreme For the twenty-fourth film layer, the thicknesses of the first to twenty-fourth film layers are shown in Table 1.
[0024] Table 1 The thickness of each layer of film of embodiment 1
[0025] Layers
[0026] After testing, the refle...
Embodiment 2
[0027] Embodiment 2: The light is incident at an oblique angle of 25°, the transparent substrate adopts quartz glass, and the film structure is Glass|(2 / 3Ta 2 o 5 4 / 3SiO2 2 ) 14 |Air is composed of alternate superposition of two thin film materials, tantalum pentoxide and silicon dioxide. Wherein, the first film layer is non-extreme tantalum pentoxide plated on the surface of the quartz glass substrate; the second film layer is non-extreme silicon dioxide plated on the first film layer ; The third film layer is non-extreme value tantalum pentoxide, which is plated on the second film layer; the fourth film layer is non-extreme value silicon dioxide, which is plated on the third film layer;… ..., tantalum pentoxide and silicon dioxide film layers alternate until the non-extreme twenty-fifth, twenty-sixth, twenty-seventh, twenty-eighth film layers, the thickness of the first to twenty-eighth film layers See Table 2.
[0028] Table two The thickness of each layer film of embo...
Embodiment 3
[0031] Example 3: The light is incident at an oblique angle of 35°, the transparent substrate is made of typical crown glass K9 glass, and the film structure is Glass|(4 / 3ZrO 2 2 / 3SiO2 2 ) 18 |Air, made of zirconium dioxide (ZrO 2 ) and silicon dioxide are alternately superimposed on two thin film materials. Wherein, the first film layer is non-extreme zirconia plated on the surface of the K9 glass substrate; the second film layer is non-extreme silicon dioxide plated on the first film layer; The third film layer is non-extreme zirconia, which is plated on the second film layer; the fourth film layer is silicon dioxide, which is plated on the third film layer; ..., zirconium dioxide and silicon dioxide film layers alternately to non-extreme thirty-fourth, thirty-fifth and thirty-sixth film layers, and the thicknesses of the first to thirty-sixth film layers are shown in Table 3.
[0032] The thickness of each layer film of table three embodiment 3
[0033]
[0034] ...
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