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Photoresist composition with branched photosensitive polystyrene-maleic anhydride as matrix resin

A maleic anhydride and polystyrene technology, applied in the field of functional polymer materials, can solve the problems of inability to achieve deep curing, large image damage, uneven section, etc., and achieve good product application performance and excellent polymer product performance. , the effect of excellent product performance

Inactive Publication Date: 2016-08-24
SUZHOU RUIHONG ELECTRONIC CHEM CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Traditional film-forming resins are linear polymers with long molecular chains that are easy to entangle. During the imaging and development process, the boundary between the exposed cross-linked part and the developed and washed-out part is prone to molecular chain involvement, resulting in cross-sectional distortion. Unevenness, and when the coating film is slightly thick, deep curing cannot be achieved, and the entanglement of molecular chains during development will damage the image to a greater degree, and it is difficult to form a pattern with a neat cross-section and high resolution

Method used

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  • Photoresist composition with branched photosensitive polystyrene-maleic anhydride as matrix resin
  • Photoresist composition with branched photosensitive polystyrene-maleic anhydride as matrix resin
  • Photoresist composition with branched photosensitive polystyrene-maleic anhydride as matrix resin

Examples

Experimental program
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Effect test

Embodiment 1

[0020] The synthesis of branched photosensitive polystyrene maleic anhydride resin: press the raw material ratio shown in table 1, add 2.08g styrene (St), 2.36g maleic anhydride in the 100ml three-necked flask that reflux condensation stirring device is housed Acid anhydride (Ma), 0.2g p-vinylbenzylmercaptan (VBT), 0.694g initiator (AIBN) and 50ml toluene, pass N into the flask 2 Seal after removing oxygen; react in an oil bath at 70°C for 20 hours under reflux and stirring, the obtained product is precipitated in toluene, using tetrahydrofuran as a solvent and toluene as a precipitating agent, dissolve and precipitate 3 times, and dry the solid in a vacuum oven at 30°C , to obtain a white solid, which is branched polystyrene maleic anhydride.

[0021] Add 16.68g propylene glycol methyl ether acetate, 4.04g branched polystyrene maleic anhydride, 0.1g triphenylphosphine and 0.044g p-methoxyphenol in the 100ml there-necked flask that stirrer and thermometer are housed, stir to m...

Embodiment 2

[0026] The synthesis of branched type photosensitive polymaleic anhydride resin: according to the raw material proportion shown in table 2, in the 100ml there-necked flask that reflux condensation stirring device is housed, once add 2.08g styrene (St), 2.352g maleic anhydride ( Ma), 0.4g p-chloromethylene styrene (VBT), 0.724g initiator (AIBN) and 50ml toluene, logical N in the flask 2 After removing the oxygen, react in an oil bath at 70°C for 22 hours under sealed reflux and stirring. The obtained product is precipitated in toluene, using tetrahydrofuran as a solvent and toluene as a precipitant, dissolving and precipitating 3 times, and drying the solid in a vacuum oven at 30°C. A white solid is obtained, which is branched polystyrene maleic anhydride.

[0027] Add 16.31g propylene glycol methyl ether acetate, 3.87g branched polystyrene maleic anhydride, 0.1g triphenylphosphine and 0.044g polymerization inhibitor in the 100ml three-necked flask that agitator and thermometer...

Embodiment 3

[0031]The synthesis of branched photosensitive maleic anhydride resin: according to the raw material proportion listed in table 3, in the 100ml there-necked flask that reflux condensation stirring device is housed, once add 2.08g styrene (St), 2.352g maleic anhydride (Maleic anhydride) ), 0.8g p-chloromethylene styrene (VBT), 0.784g initiator (AIBN) and 50ml toluene, pass N into the flask 2 Seal after removing oxygen; react in an oil bath at 70°C for 24 hours under reflux and stirring, the obtained product is precipitated in toluene, using tetrahydrofuran as a solvent and toluene as a precipitating agent, dissolve and precipitate 3 times, and dry the solid in a vacuum oven at 30°C , to obtain a white solid, which is branched polystyrene maleic anhydride.

[0032] Add 16.05g propylene glycol methyl ether acetate, 3.23g branched polystyrene maleic anhydride, 0.1g catalyzer and 0.044g polymerization inhibitor in the 100ml there-necked flask that stirrer and thermometer are housed...

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Abstract

The invention discloses resin with branched photosensitive polystyrene-maleic anhydride as the matrix. The resin is applied to photoresist and belongs to the field of ultraviolet curing. The branched photosensitive resin is mainly characterized by synthesizing a polystyrene-maleic anhydride copolymer with a branched structure by using a sulfydryl-containing chain transfer agent, styrene and maleic anhydride as monomers to undergo precipitation polymerization in a toluene solution, then grafting hydroxyl-containing acrylic monomers and introducing a photosensitive group to obtain branched resin with the photosensitive group and finally using the branched resin in negative photoresist. The branched resin has the beneficial effects that a preparation method is simple; the reaction conditions are mild; the equivalents of double bonds of the resin can be controlled by introducing the hydroxyl-containing acrylic monomers with different degrees of functionality; when applied in the negative photoetching process, the branched resin has excellent developing properties and higher developing speed, thus widening the application field of the branched photosensitive resin.

Description

technical field [0001] The invention relates to the field of functional polymer materials, in particular to a branched photosensitive polystyrene maleic anhydride copolymer applied in the field of photoresist. Background technique [0002] Polystyrene maleic anhydride is a polymer with a regular structure, and it can be designed in-depth by conventional methods, which promotes the intersection of polystyrene maleic anhydride polymers and other disciplines , has opened up a new application platform for the traditional field of polymer materials. [0003] Branched polystyrene maleic anhydride copolymer is widely used in coatings, water treatment agents, inks and other fields due to its good heat resistance, rigidity, dimensional stability and excellent film-forming properties. It is a hotspot in molecular research, but there are few reports on its application in photoresists. [0004] Photoresist, also known as photoresist, plays an important role in the microelectronics ind...

Claims

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Application Information

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IPC IPC(8): C08F212/08C08F222/06C08F212/14G03F7/004
Inventor 刘敬成李虎刘晓亚穆启道孙小侠刘仁纪昌炜
Owner SUZHOU RUIHONG ELECTRONIC CHEM CO LTD