Preparation method of quartz glass

A quartz glass and porous quartz technology, applied in glass manufacturing equipment, glass molding, manufacturing tools, etc., can solve the problems of prolonged production cycle, high energy consumption, low purity and uniformity of quartz glass, etc. The process is simple and the effect of increasing the preparation cost

Active Publication Date: 2016-09-14
YANGTZE OPTICAL FIBRE & CABLE CO LTD
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Problems solved by technology

The electrofusion method is to place the quartz sand in a high-temperature-resistant container and heat it through an electric furnace to directly melt the quartz sand to form quartz glass. The purity and uniformity of the quartz glass prepared by this method are not high, and bubbles are easily generated inside. It is generally used for Preparation of quartz products with lower requirements; plasma spraying technology is to melt and spray quartz sand on the target target through a plasma flame to directly form transparent quartz glass. This technology has been used in some enterprises to prepare high-purity quartz columns and quartz tubes. However, due to the limitation of high equipment cost, high energy consumption and long production cycle, it has not been widely used; the gas refining method is currently the most widely used preparation technology in the quartz product industry. The quartz sand is heated by a hydrogen-oxygen flame and fused and deposited On the ...

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  • Preparation method of quartz glass

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preparation example Construction

[0029] The preparation method of quartz glass provided by the present invention comprises the following steps:

[0030] Pre-deposition: The quartz particles are heated and melted at an ambient temperature of 1500°C to 1800°C, sprayed on the substrate and completely melted to form a transparent quartz glass base layer.

[0031] Preferably, the ambient temperature is between 1550°C and 1700°C; by means of rotary spraying, the feeding rate is lower than 100g / min, more preferably between 8g / min and 40g / min; the height of the transparent quartz glass base layer is more than 10mm , preferably 15mm or more.

[0032] (a) heating the quartz particles to partial melting to form a porous quartz body; specifically:

[0033] The oxyhydrogen flame is used to heat the quartz particles until they are partially melted and sprayed on the substrate to form a porous quartz body.

[0034] Preferably, it is sprayed on a pre-deposited transparent quartz glass substrate, and the substrate can move ...

Embodiment 1

[0046] A preparation method of quartz glass, comprising the following steps:

[0047] Pre-deposition: as figure 1 As shown, the blowtorch (4) is connected to H at the same time 2 Pipe (13) and O 2 In the pipeline (14), hydrogen and oxygen are ignited to form a hydrogen-oxygen flame (8), and the theoretical reaction ratio of hydrogen and oxygen is 2:1. In the present invention, in order to ensure that hydrogen is fully burned, the ratio of hydrogen and oxygen is controlled at 1.0:1~1.8 : 1, so that the oxygen is relatively excess. Place the blowtorch in the furnace cavity (5), the blowtorch is located on the central axis of the furnace cavity, the flame is downward, and the furnace cavity is heated. When the furnace cavity temperature reaches above 1500 ℃, the gas supply speed is adjusted to make the furnace cavity temperature stable. . The furnace cavity is maintained between 1500°C and 1800°C, preferably between 1550°C and 1700°C. Inert gases such as nitrogen can be intr...

Embodiment 2

[0062] Pre-deposition: as figure 1 As shown, quartz sand with an average particle size of 120 μm was charged into the hopper, and a slight sinusoidal vibration was applied to the hopper for use. Sequentially pass hydrogen and oxygen into the burner and ignite to form a hydrogen-oxygen flame. The flow rate of hydrogen is 55L / min and the flow rate of oxygen is 40L / min. The furnace is heated to 1700°C, and the carrier gas valve is opened to flow into the burner. The carrier gas is hydrogen. , the flow rate is 7L / min. After the air flow is stable, open the feeder, adjust the rotation speed of the feeding screw, control the feeding speed at 45g / min, and open the rotating bracket, the speed is 18rpm / min, and the quartz sand is gradually deposited on the substrate. and forming transparent quartz glass under the high temperature of the flame, after 15 minutes, a 12mm thick quartz base layer is formed on the substrate.

[0063] (a) Heating the quartz particles to partial melting to fo...

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Abstract

The invention discloses a preparation method of quartz glass. The method comprises the steps of: (a) heating quartz particles to partial melting to form a porous quartz body; (b) subjecting the porous quartz body obtained in step (a) to dehydration treatment so as to obtain a dehydrated porous quartz body; and (c) heating and sintering the porous quartz body obtained in step (b) to form the quartz glass. The invention relates to the technical field of preparation of a quartz glass material from quartz sand or quartz powder through oxyhydrogen flame, as a breakthrough, quartz sand at a semi-molten state is sprayed to the porous quartz body, and the porous quartz body is dehydrated, the hydroxy content is greatly reduced to less than 15ppm, or even below 5ppm, thus improving the purity of the prepared quartz glass material without significant increase of the preparation cost by a simple preparation process and preparing the high purity quartz glass.

Description

technical field [0001] The invention belongs to the field of optical fibers and cables, and more particularly, relates to a preparation method of quartz glass. Background technique [0002] Quartz glass is widely used in light source, electronics, optical communication, instrumentation, laser, aerospace, nuclear technology and national defense due to its excellent high temperature resistance, thermal expansion coefficient, thermal shock resistance, chemical stability, insulation and optical properties and other high-tech fields. At present, the mainstream production methods of high-purity quartz glass are chemical synthesis method, electrofusion method, gas refining method and plasma spraying. [0003] Chemical synthesis is carried out using silicon-containing precursors such as SiCl 4 etc.), heated by flame, reacted with hydrogen and oxygen, hydrolyzed to form silica soot body, deposited on the target target to form porous quartz body, and then dehydrated and sintered at ...

Claims

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Application Information

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IPC IPC(8): C03B20/00C03C6/04
CPCC03B19/066C03B20/00C03C1/00
Inventor 郭飞熊良明曹蓓蓓吕大娟魏华珍
Owner YANGTZE OPTICAL FIBRE & CABLE CO LTD
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