Nano-porous material pore channel inner surface plasma modification treatment method and application

A nano-porous and treatment method technology, applied in the field of ion modification treatment, can solve the problems of small number of surface groups, long treatment time, high cost, etc., and achieve the effect of shortening time, increasing quantity and activity, and improving efficiency

Inactive Publication Date: 2016-10-19
EAST CHINA UNIV OF SCI & TECH
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Problems solved by technology

[0005] The purpose of the present invention is to provide a plasma modification treatment method for the inner surface of the pores of nanoporous

Method used

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  • Nano-porous material pore channel inner surface plasma modification treatment method and application
  • Nano-porous material pore channel inner surface plasma modification treatment method and application
  • Nano-porous material pore channel inner surface plasma modification treatment method and application

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Example Embodiment

[0024] Implementation mode one

[0025] The plasma processing method for nanoporous materials in the present invention has similar processing methods and principles for different materials and different functional modifications. Those of ordinary skill in the art only need to generate plasma based on the rupture of the chemical bonds of the materials and the atmosphere. The degree of difficulty, adjust the processing time, voltage, atmosphere and other processing conditions. Therefore, this specification mainly provides typical one-dimensional nanoporous silica SBA-15, two-dimensional nanoporous graphene oxide GO, and three-dimensional interconnected nanoporous silica MCF as typical nanoporous models, but not limited to the above materials. . The change of surface activity in the pores before and after plasma treatment was characterized by infrared spectroscopy, ultraviolet spectroscopy, X-ray photoelectron spectroscopy and other methods. The nanoporous material after plasma tr...

Example Embodiment

[0026] Example 1. Treatment of SBA-15 by plasma under oxygen atmosphere

[0027] In such figure 1 In the plasma processing device shown, the dielectric barrier discharge method is adopted at normal temperature and normal pressure, and a high voltage generator is used to generate a voltage of 40 kV and a high frequency of 10 kHz, and discharge in a quartz reactor cavity. The quartz reactor cavity is placed between two stainless steel electrodes at a distance of 8 mm. 1 gram of SBA-15 is evenly spread in a thin layer on the bottom of the reactor to ensure that all powders are treated with plasma in a similar environment. Oxygen gas is introduced, and the dielectric barrier discharge generates plasma under the condition of 110 watts of output power. The SBA-15 material is processed for 30 minutes, and the processed material is recorded as SBA-15-O.

[0028] The UV spectrum of SBA-15 before and after plasma treatment is as follows figure 2 As shown, the analysis results show that the...

Example Embodiment

[0029] Example 2. Treatment of SBA-15 by plasma under trifluoromethane atmosphere

[0030] In such figure 1 In the plasma processing device shown, the dielectric barrier discharge method is adopted under normal temperature and normal pressure, and a high voltage generator is used to generate a voltage of 25 kV and a high frequency of 15 kHz, and discharge in the quartz reactor cavity. The quartz reactor cavity is placed between two stainless steel electrodes at a distance of 10 mm. 1 gram of SBA-15 is evenly spread in a thin layer on the bottom of the reactor to ensure that all powders are treated with plasma in a similar environment. Bring in trifluoromethane gas, and under the condition of an output power of 80 watts, the dielectric barrier discharge generates plasma, and the SBA-15 material is processed for 40 minutes. The processed material is recorded as SBA-15-F.

[0031] The infrared spectrum of SBA-15 before and after plasma treatment is as follows image 3 As shown, the a...

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Abstract

The invention provides a nano-porous material pore channel inner surface plasma modification treatment method. The method comprises the step that a nano-porous material is treated in different atmospheres in a normal-temperature and atmospheric-pressure dielectric barrier discharge mode, wherein the output power is controlled to range from 80 w to 110 w, the treatment time ranges from 20 min to 40 min, the alternating current power supply amplitude ranges from 30 KV to 50 KV, and the frequency can be adjusted between 5 KHz and 20 KHz. The nano-porous material treated with plasma is subjected to organic functional modification in pore channels, and the modified nano-porous material can serve as an efficient adsorption material; when the nano-porous material treated with plasma is subjected to metal loading, the metal-loaded nano-porous material can serve as an efficient catalyst.

Description

technical field [0001] The invention relates to a modification treatment technology for the inner surface of a nanoporous material pore channel, in particular to a plasma modification treatment method. Background technique [0002] Due to its rich pore structure, large specific surface area, and excellent properties such as functional modification, nanoporous materials have broad application prospects in the fields of adsorption and separation, catalysis, and medicine and biology. In the usual modification process of nanoporous materials, the site energy of the pore port is high, and the functional group modification easily occurs at the pore opening, resulting in channel blockage and low loading of functionalized substances. Therefore, it is of great significance to enhance the surface activity in the pores, increase the number of surface active groups, and develop a better modification method to make the functionalized substances evenly distributed in the pores. [0003] ...

Claims

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Application Information

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IPC IPC(8): B01J20/18B01J32/00B01J29/035B01J21/18B01J23/50B01J20/30B01D53/02B82Y30/00
CPCB01D53/02B01D2257/504B01J20/183B01J20/186B01J21/18B01J23/50B01J29/035B82Y30/00Y02C20/40
Inventor 胡军黄佳丽高洁刘洪来
Owner EAST CHINA UNIV OF SCI & TECH
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