Anti-pollution clean-keeping inorganic liquid glass protective agent for surface layer of object surface
A liquid glass, strong protective agent technology, applied in the field of materials, can solve the problems of coating bulging, cracking, peeling, etc., to improve work efficiency, prevent algae growth, and reduce construction costs.
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Embodiment 1
[0017] An anti-fouling and cleaning inorganic liquid glass strengthening agent for object surface layer, the main raw materials in parts by weight are: 30 parts of nano-silicon dioxide, 5 parts of carbon nanotubes, 15 parts of polyurethane emulsion, 5 parts of LDSMPA1 liquid agent, and 15 parts of ethanol , 0.5 part of ammonium chloride, 0.1 part of pentaerythritol; the preparation method of the nano silicon dioxide: first cut the silicon dioxide film into 1 cm × 1 cm fragments, then implant the fragments into ions, and use argon as the working gas, The vacuum degree of the sputtering chamber is 2.0×10 -4 Pa, the discharge voltage is 65V, the beam current voltage is 1756V, and the growth beam current is 8mA. After sputtering, silicon dioxide clusters are obtained, and then deionized water is added and ultrasonic treatment is performed. The ultrasonic power is 2785W, the temperature is 800°C, and the time for 15 minutes, after the ultrasonic wave is over, silicon dioxide nanopa...
Embodiment 2
[0021] An inorganic liquid glass strengthening agent for anti-fouling and cleaning on the surface layer, the main raw materials in parts by weight are: 33 parts of nano-silicon dioxide, 6 parts of carbon nanotubes, 18 parts of polyurethane emulsion, 6 parts of LDSMPA1 liquid agent, and 20 parts of ethanol , 0.5 part of ammonium chloride, 0.1 part of pentaerythritol; the preparation method of the nano silicon dioxide: first cut the silicon dioxide film into 1 cm × 1 cm fragments, then implant the fragments into ions, and use argon as the working gas, The vacuum degree of the sputtering chamber is 2.0×10 -4 Pa, the discharge voltage is 65V, the beam current voltage is 1756V, and the growth beam current is 8mA. After sputtering, silicon dioxide clusters are obtained, and then deionized water is added and ultrasonic treatment is performed. The ultrasonic power is 2785W, the temperature is 800°C, and the time for 15 minutes, after the ultrasonic wave is over, silicon dioxide nanopa...
Embodiment 3
[0025] An anti-fouling and cleaning inorganic liquid glass strengthening agent for surface layer anti-fouling, the main raw materials in parts by weight are: 35 parts of nano-silicon dioxide, 8 parts of carbon nanotubes, 21 parts of polyurethane emulsion, 8 parts of LDSMPA1 liquid agent, and 23 parts of ethanol , 0.8 part of ammonium chloride, 0.4 part of pentaerythritol; the preparation method of the nano silicon dioxide: first cut the silicon dioxide film into 1 cm × 1 cm segments, then implant the segments with ions, and use argon as the working gas, The vacuum degree of the sputtering chamber is 2.0×10 -4 Pa, the discharge voltage is 65V, the beam voltage is 1756V, and the growth beam current is 8mA. After sputtering, silicon dioxide clusters are obtained, and then deionized water is added and ultrasonic treatment is performed. The ultrasonic power is 2785W, the temperature is 900°C, and the time It was 57min, after the ultrasonic was finished, silicon dioxide nanoparticle...
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