Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A kind of resistive polymer humidity sensitive material and preparation method thereof

A moisture-sensitive material and resistance-type technology, which is applied in the analysis of materials, material analysis through electromagnetic means, and material resistance, can solve the problems of easy slip loss, hindering popularization and application, high humidity resistance and poor long-term stability, etc. Achieve high humidity resistance, good long-term stability, good humidity response, and good linearity

Active Publication Date: 2018-08-31
GUANGZHOU AOSONG ELECTRONIC CO LTD
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this type of sensor mostly uses traditional linear polymer electrolytes as sensitive materials, which are prone to slip and loss in high-humidity environments. As the humidity increases, the polymer materials will absorb moisture and expand, resulting in their high-humidity resistance and long-term Poor stability hinders its further popularization and application to a certain extent

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of resistive polymer humidity sensitive material and preparation method thereof
  • A kind of resistive polymer humidity sensitive material and preparation method thereof
  • A kind of resistive polymer humidity sensitive material and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] Take 20 parts of acryloyloxyethyltrimethylammonium chloride, 10 parts of acrylamide, 10 parts of methyl methacrylate, 2 parts of lithium acrylate, and 0.5 parts of initiator AIBN, and place it in a Add methanol to the four-necked flask of the condenser tube and the nitrogen protection device to completely dissolve the reactants, and then react at a constant temperature of 65-85° C. for 4 hours. After the reaction is finished, the obtained product is washed with ether, and then vacuum-dried at room temperature to obtain a resistive polymer moisture-sensitive material.

Embodiment 2

[0039] Take 20 parts of methacryloyloxyethyltrimethylammonium chloride, 40 parts of diethylaminoethyl methacrylate, 10 parts of styrene, 2 parts of sodium styrene sulfonate, 1 part of initiator AIBN, and place in a Methanol was added to a four-necked flask with a thermometer, a stirrer, a reflux condenser and a nitrogen protection device to completely dissolve the reactant, and then reacted at a constant temperature of 65-85° C. for 6 hours. After the reaction, the obtained product was washed with ether and dried in vacuum at room temperature to obtain a resistive polymer moisture-sensitive material.

Embodiment 3

[0041] Take 20 parts of methacryloylpropyltrimethylammonium chloride, 20 parts of dimethyl allylamine, 10 parts of methyl acrylate, 5 parts of sodium styrene sulfonate, and 0.8 parts of initiator AIBN, and put them in the Add methanol to a four-necked flask equipped with a thermometer, a stirrer, a reflux condenser and a nitrogen protection device to completely dissolve the reactants, and then react at a constant temperature of 65-85° C. for 6 hours. After the reaction, the obtained product was washed with ether and dried in vacuum at room temperature to obtain a resistive polymer moisture-sensitive material.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a resistive polymer moisture-sensitive material, which is produced by polymerization reaction of four components A, B, C and D; component A is acryloyloxyethyltrimethylammonium chloride, methacrylic acid One of acylpropyltrimethylammonium chloride and methacryloyloxyethyltrimethylammonium chloride; component B is N-methallylamine, acrylamide, dimethylallyl Amine, dimethylaminoethyl methacrylate, diethylaminoethyl methacrylate, dimethylaminoethyl acrylate; component C is methyl methacrylate, butyl methacrylate, methyl acrylate One of ester, butyl acrylate, styrene, allyl benzene; component D is one of sodium styrene sulfonate and lithium acrylate. The resistive polymer moisture-sensitive material of the invention has good high-humidity resistance and long-term stability.

Description

technical field [0001] The invention relates to a polymer material, in particular to a polymer material with humidity sensitive resistance properties and a preparation method thereof. Background technique [0002] Currently commercialized humidity sensors mainly include inorganic ceramic semiconductor type and organic polymer type. The polymer humidity sensor has become the mainstream of the humidity sensor because of its good response characteristics, wide measurement range, good stability, room temperature detection, easy integration, miniaturized mass production, and low price. Among them, the polymer resistive humidity sensor is very simple to prepare, has good performance, and is easy to integrate into the system to realize the measurement and control of humidity. It is one of the research and development of humidity sensors. However, this type of sensor mostly uses traditional linear polymer electrolytes as sensitive materials, which are prone to slip and loss in high...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C08F220/34C08F220/56C08F220/14C08F220/06C08F212/08C08F212/14C08F226/02C08F220/18C09D133/14C09D7/63G01N27/04
CPCG01N27/048C09D133/14C08F220/34C08F226/02C08K5/02C08F220/1804C08F220/06C08F220/14C08F212/14C08F212/08C08F220/56
Inventor 张宾
Owner GUANGZHOU AOSONG ELECTRONIC CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com