Device for medium-temperature organometallic chemical vapor deposition of TiO2-Al2O3 composite coating and coating method

Abstract

The invention discloses a device for medium-temperature organometallic chemical vapor deposition of a TiO2-Al2O3 composite coating and a coating method. An organometallic chemical vapor deposition method and a horizontal furnace device are adopted, and raw materials are pre-mixed in a small deposition chamber, so that dense codeposition of the TiO2-Al2O3 composite coating on the surface of stainless steel within the temperature range of 250-450 DEG C is achieved, and the purpose of restraining coking and carbon deposition on the surface of the stainless steel is achieved.

Description

technical field [0001] The invention belongs to the technical field of material surface treatment and coating, and relates to a medium-temperature metal-organic chemical vapor deposition TiO2-Al2O3 composite coating device and coating method Background technique [0002] When the future aircraft is flying at high speed, the combustion reaction in the combustion chamber will release a large amount of heat, making the wall temperature of the combustion chamber as high as 3000K, which exceeds the temperature resistance limit of existing materials. Therefore, a reasonable thermal management plan becomes the key to restrict the further development of high-speed aircraft . Active cooling using endothermic hydrocarbon fuels has become a potentially effective solution to thermal management problems. Before the hydrocarbon fuel is injected into the combustion chamber, it first flows on the wall of the engine, and through the physical heating of the fuel itself and the high-temperatu...

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Problems solved by technology

However, considering the complexity of the real cooling channel structure, among the above methods, only the chemical vapor deposition method is not limited by the complex structure of the sample.

However, the traditional high-temperature chemical vapor deposition will cause changes in the structure and properties of the substrate material itself due to the high deposition temperature, while the metal-organic chemical vapor deposition technology can effectively reduce the deposition temperature without changing the structure and properties of the substrate material itself, but there are problems. The internal stress of a single coating is relatively large, and the coating is prone to cracking

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