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A method for preparing zinc oxide pattern without residue layer by using room temperature transfer imprinting technology

A no-residue layer transfer imprinting technology, applied in the direction of photomechanical equipment, pattern surface photolithography, instruments, etc., can solve the problems of complex process, limited application of patterned ZnO, difficult large-area preparation, etc., to achieve The effect of mild and easy-to-control conditions, low requirements for reaction equipment, and simple method

Active Publication Date: 2019-11-12
JIANGNAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the above-mentioned patterning method generally has a complicated process and requires special instruments and equipment, making it difficult to achieve large-area preparation; at the same time, the ZnO patterns constructed by the above-mentioned methods all have residual layers, which limits the application of patterned ZnO

Method used

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  • A method for preparing zinc oxide pattern without residue layer by using room temperature transfer imprinting technology
  • A method for preparing zinc oxide pattern without residue layer by using room temperature transfer imprinting technology
  • A method for preparing zinc oxide pattern without residue layer by using room temperature transfer imprinting technology

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Step 1: Preparation of precursor solution

[0027] Solid polymethyl methacrylate (PMMA) was heated and dissolved in acetone solution by ultrasonic heating to prepare a PMMA solution with a mass concentration of 2.5%, and mixed with an equal volume of 1 mol / L zinc acetate ethanol solution to prepare a precursor solution.

[0028] Step 2: Preparation of soft template

[0029] Weigh the prepolymer of polydimethylsiloxane (PDMS) and the initiator, the mass ratio is 10:1, stir and mix; then cast on a silicon template with a square size of 10 μm and a spacing of 10 μm, at 60 ° C Curing in the environment; after curing, the PDMS is separated from the silicon template to obtain a PDMS soft template.

[0030] Step 3: Spin coating precursor solution on soft template surface

[0031] Under the conditions of a rotation speed of 4000rpm and a rotation time of 30s, the precursor solution was spin-coated on the surface of the PDMS soft template to obtain a PDMS soft template with a ...

Embodiment 2

[0039] Step 1: Preparation of precursor solution

[0040] Solid polymethyl methacrylate (PMMA) was heated and dissolved in acetone solution by ultrasonic heating to prepare a PMMA solution with a mass concentration of 1%, and mixed with an equal volume of 0.5 mol / L zinc acetate ethanol solution to prepare a precursor solution.

[0041] Step 2: Preparation of soft template

[0042] Weigh the prepolymer of polydimethylsiloxane (PDMS) and initiator, the mass ratio is 10:1, stir and mix; then cast on the silicon template with a square width of 1 μm and a spacing of 1 μm, at 80 ° C Curing in the environment; after curing, the PDMS is separated from the silicon template to obtain a PDMS soft template.

[0043] Step 3: Spin coating precursor solution on soft template surface

[0044] Under the conditions of a rotation speed of 6000 rpm and a rotation time of 30 s, the precursor solution was spin-coated on the surface of the PDMS soft template to obtain a PDMS soft template with a c...

Embodiment 3

[0052] Step 1: Preparation of precursor solution

[0053] Solid polystyrene (PS) was heated and dissolved in acetone solution by ultrasonic heating to prepare a PS solution with a mass concentration of 1.5%, and mixed with an equal volume of 1 mol / L zinc acetate ethanol solution to prepare a precursor solution.

[0054] Step 2: Preparation of soft template

[0055] Weigh the prepolymer of polydimethylsiloxane (PDMS) and the initiator, the mass ratio is 10:1, stir and mix; then cast on the silicon template with a square width of 1 μm and a spacing of 1 μm, at 60 ° C Curing in the environment; after curing, the PDMS is separated from the silicon template to obtain a PDMS soft template.

[0056] Step 3: Spin coating precursor solution on the surface of soft template

[0057] Under the conditions of a rotation speed of 4000rpm and a rotation time of 30s, the precursor solution was spin-coated on the surface of the PDMS soft template to obtain a PDMS soft template with a composit...

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Abstract

The invention relates to a method for preparing a zinc oxide pattern without a residual layer by using a room-temperature transfer imprinting technology. The zinc oxide pattern is prepared according to the following method of (1) firstly, mixing a thermoplastic polymer solution and zinc oxide sol or a zinc salt solution to prepare a precursor liquid; (2) secondly, spin-coating or coating the precursor liquid on a surface of a soft template with a concave-convex structure to form a composite film; (3) thirdly, allowing the soft template obtained in the step (2) under a room temperature to be in contact with a hydrophilic substrate, and transferring the composite film to a surface of the substrate; (4) fourthly, calcining a sample obtained in the step (3), and cooling the sample to the room temperature; and (5) finally, placing the sample obtained in the step (4) in a mixed solution of a zinc salt, hexamethylenetetramine and water, and forming the zinc oxide pattern without the residual layer on the surface of the substrate under a hydrothermal condition. The invention relates to the technical field of micronano processing of a material, and the zinc oxide pattern without the residual layer can be prepared on a planar substrate and a cambered-surface substrate by using the room-temperature transfer imprinting technology.

Description

technical field [0001] The invention relates to the technical field of micro-nano processing of materials, in particular to a method for preparing a zinc oxide pattern without a residue layer by using a room temperature reverse embossing technology. Background technique [0002] Zinc oxide (ZnO) material is an important direct bandgap semiconductor material. Due to its high transmittance to visible light, it can be used as a transparent conductive coating; it has a photoelectric effect and can be used in ultraviolet laser devices and solar cells; it has pyroelectric and piezoelectric effects and can be used as a heat-sensitive and pressure-sensitive device. . Neatly arranged ZnO nanorod arrays have high application value in solar cells, electrochemical sensors, and nano-ultraviolet lasers. [0003] Currently, methods for preparing patterned ZnO include electron beam lithography, nanosphere etching, laser interference lithography, nanoimprinting, and block copolymer etching...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/00
CPCG03F7/0002
Inventor 石刚车友新李赢王大伟倪才华桑欣欣王利魁
Owner JIANGNAN UNIV