Double-layer heterostructure mold, its manufacturing method and application in micro nano material preparation

A double-layer heterogeneous, manufacturing method technology, applied in the direction of nanostructure manufacturing, nanotechnology, nanotechnology, etc., can solve the problems of difficult mass production and complex preparation, and achieve easy mass production, simple preparation, high precision effect

Inactive Publication Date: 2017-05-31
ZHEJIANG UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the existing preparation is relatively complicated and the technology is almost all laboratory-level synthesis technology, and it is difficult to realize mass production in industrial production.

Method used

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  • Double-layer heterostructure mold, its manufacturing method and application in micro nano material preparation
  • Double-layer heterostructure mold, its manufacturing method and application in micro nano material preparation
  • Double-layer heterostructure mold, its manufacturing method and application in micro nano material preparation

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0043] Embodiment 1 The micro-nano secondary structure mold according to the present invention includes a silicon liner 1, the upper surface of the silicon liner 1 is distributed with multiple rows of micron-scale groove groups along the axial direction of the silicon liner, and each column contains The above-mentioned groove group includes several micron-sized grooves 2 arranged equidistantly, and the axial spacing gradient of two adjacent rows of groove groups gradually increases; The groove 2 and the nanoscale pores 3 distributed on the surface of the micrometer groove 2 form a secondary structure.

[0044] The micro-groove 2 is a concave inverted quadrangular truss.

[0045]The side length of the inverted quadrangular prism of the micron groove 2 is 100 microns.

[0046] The nanoscale hole 3 is a concave hemispherical structure.

[0047] The hemispherical diameter of the nanoscale hole 3 is 200 nanometers.

Embodiment 2

[0049] According to the manufacturing method of the micro-nano secondary structure mold described in embodiment 1, the manufacturing method comprises the following steps:

[0050] a) After the silicon wafer 4 is polished and cleaned, as a silicon lining board, one side of the silicon lining board is selected to face up and placed in a dry oxygen oxidation reaction furnace, and pure oxygen is introduced into the reaction furnace, and the temperature is 1000 ° C. , deposit a layer of SiO on the front side of the silicon wafer 4 by thermal oxidation 2 , to obtain a front side with a layer of 1μm thick SiO 2 The silicon liner of layer 5 is denoted as silicon liner A;

[0051] b) SiO on silicon substrate A 2 Coat the surface of layer 5 with a layer of SU-8 photoresist as a mask, and open a window on the photoresist layer, then immerse it in the BOE solution, place it at room temperature until the silicon wafer 4 is exposed by etching at the window, take it out and clean it, and r...

Embodiment 3

[0062] The application of the micro-nano secondary structure mold described in Example 1 in the preparation of micro-nano materials is characterized in that: the application is carried out according to the following method (taking PDMS as an example):

[0063] 1) Soak the mold in the silanization agent of the fluorosilane solution, soak for more than 2 hours at room temperature, perform silanization and hydrophobic treatment on the surface, then wash and dry to obtain the hydrophobic treatment mold, and set it aside;

[0064] 2) Prepare PDMS prepolymer with PDMS base material and PDMS curing agent at a mass ratio of 9:1~10:1. Then add silicone oil and mix thoroughly again to obtain pouring fluid;

[0065] 3) Pouring the configured pouring solution on the surface of the mold with micro-nano grooves after hydrophobization treatment, and gradually degassing after maintaining at 0.02MPa for 20 minutes, and then curing at 70°C for 100 minutes to obtain cured PDMS;

[0066] 4) Care...

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Abstract

The invention provides a double-layer heterostructure mold, its manufacturing method and application in micro nano material preparation. The mold includes a silicon lining plate, multiple micro groove sets are formed in the upper surface layer of the silicon lining plate in the axial direction of the silicon lining plate, each micro groove set includes a number of micro grooves formed at equal intervals, and the gradient of the axial spacing between every two adjacent groove sets is gradually increased; nanoscale holes are formed in the upper surface of the whole silicon lining plate, and the micro grooves and the nanoscale holes formed in the surfaces of the micro grooves form a secondary structure. The manufacturing method includes the steps that a specific concave square-pyramid-frustum micro structure is etched by means of a chemical method, and a uniform and ordered concave semispherical nano structure is indirectly generated on a silicon substrate by means of a porous AAO film. The mold has the advantages that a concave square pyramid frustum can be directly manufactured, the manufacture is simple and direct, the nano structure is uniform, small in size and high in precision, PDMS is injected into the mold, a specific dropwise condensed self-water-collected micro nano material can be obtained through simple processing, large scale production is easily achieved, and the reuse rate is high.

Description

technical field [0001] The invention relates to a double-layer heterogeneous structure mould, a manufacturing method and its application in preparing micro-nano materials, belonging to the field of moulds. Background technique [0002] Since the German Gleiter successfully prepared nano-scale metal crystal palladium, copper, iron, etc. in 1984, at the same time, due to the surface effect, volume effect and quantum size effect of nanomaterials, they have shown many unique physical and chemical properties. Its research in the field of materials has gradually become a hot spot. Scientists have gradually discovered that nanomaterials have broad application prospects in medicine, catalysis, light absorption, magnetic media, water treatment and new materials due to their structural characteristics. The existing methods for preparing micro-nano materials can be mainly divided into two categories: chemical methods and physical methods. Specifically, there are mainly methods such a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B82B1/00B82B3/00B82Y30/00B82Y40/00
CPCB82B1/00B82B3/0004B82B3/0009B82Y30/00B82Y40/00
Inventor 董健金焱立龙芝剑孙笠董鹤
Owner ZHEJIANG UNIV OF TECH
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