Plant cultivation medium and preparation method thereof
A technology for cultivating substrates and plants, applied in the field of plant cultivation substrates and their preparation, can solve the problems of lack of good water storage and water release effects, increased greening costs, and no response, and achieves good commercial potential, strong practicability, and matching than the effect of science
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0041] A plant cultivation substrate, which is composed of the following components by weight:
[0042] 65.7 parts of fungus waste residue, 12 parts of river sand, 8 parts of slag, 20 parts of phytonutrients, 5 parts of plant water-retaining slow-release agents, and 10 parts of auxiliary materials.
[0043] The fungus waste residue is composed of the following components in percentages by weight: 75% of bisporus mushroom waste residue, 15% of shiitake mushroom waste residue, 5% of Pleurotus eryngii, and 5% other artificial cultivation fungus waste residue.
[0044] The phytonutrient is composed of the following components by weight percentage: superphosphate 40%, potassium sulfate 20%, potassium dihydrogen phosphate 20%, magnesium sulfate 10%, sodium nitrate 5%, and ammonium nitrate 5%.
[0045] The auxiliary materials include sealing treatment agents, plant activators, fusion agents, anti-caking agents and plant growth regulators.
[0046] The preparation method includes the following ...
Embodiment 2
[0062] A plant cultivation substrate, which is composed of the following components by weight: 89.6 parts of fungus waste residue, 8 parts of river sand, 12 parts of slag, 3 parts of plant nutrients, 15 parts of plant water-retaining slow-release agents, and auxiliary materials 5 servings.
[0063] The fungus waste residue is composed of the following components in percentages by weight: 80% of bisporus mushroom waste residue, 5% of shiitake mushroom waste residue, 10% Pleurotus eryngii, and 5% other artificial cultivation fungus waste residue.
[0064] The phytonutrient is composed of the following components by weight percentage: superphosphate 40%, potassium sulfate 20%, potassium dihydrogen phosphate 20%, magnesium sulfate 10%, sodium nitrate 5%, and ammonium nitrate 5%.
[0065] The auxiliary materials include sealing treatment agents, plant activators, fusion agents, anti-caking agents and plant growth regulators.
[0066] The preparation method includes the following steps:
[0...
Embodiment 3
[0082] A plant cultivation substrate, which is composed of the following components by weight: 73.9 parts of fungus waste residue, 12 parts of river sand, 9 parts of slag, 15 parts of plant nutrients, 9 parts of plant water-retaining slow-release agent, and auxiliary materials 10 servings.
[0083] The fungus waste residue is composed of the following components in percentages by weight: 75% of bisporus mushroom waste residue, 15% of shiitake mushroom waste residue, 5% of Pleurotus eryngii, and 5% other artificial cultivation fungus waste residue.
[0084] The phytonutrient is composed of the following components by weight percentage: superphosphate 40%, potassium sulfate 20%, potassium dihydrogen phosphate 20%, magnesium sulfate 10%, sodium nitrate 5%, and ammonium nitrate 5%.
[0085] The auxiliary materials include sealing treatment agents, plant activators, fusion agents, anti-caking agents and plant growth regulators.
[0086] The preparation method includes the following steps: ...
PUM
Property | Measurement | Unit |
---|---|---|
Diameter | aaaaa | aaaaa |
Diameter | aaaaa | aaaaa |
Diameter | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com