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Method for rapidly removing aromatic N-alkyl dyestuff

An aromatic and alkyl technology, applied in the field of photocatalytic degradation

Active Publication Date: 2017-08-01
JIANGSU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

So far, no research has been found on adding chloroauric acid solution to aromatic N-alkyl dye aqueous solution, and then using semiconductor photocatalyst to remove aromatic N-alkyl dye pollutants under visible light irradiation

Method used

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  • Method for rapidly removing aromatic N-alkyl dyestuff
  • Method for rapidly removing aromatic N-alkyl dyestuff
  • Method for rapidly removing aromatic N-alkyl dyestuff

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] Example 1 Adding bismuth tungstate to the mixed solution of chloroauric acid and rhodamine B for photocatalytic experiment

[0021] (1) Prepare rhodamine B (RhB), methyl violet (MV), and methylene blue (MB) solutions with a concentration of 10 mg / L, and place the prepared solution in a dark place.

[0022] (2) Under stirring, take 0.7 mL of the prepared 3.3 mg / L chloroauric acid solution and add it into the photocatalytic reactor and keep it for 30 minutes. like image 3 As shown, the zeta potential test of its complex shows that it is positively charged.

[0023] (3) Weigh 100 mg of self-made bismuth tungstate photocatalyst, such as figure 1 From the X-ray diffraction pattern, it can be seen that bismuth tungstate was successfully prepared, and the scanning electron microscope showed a layered flower structure. like figure 2 As shown, its zeta potential test shows that it is negatively charged, it is placed in the above photocatalytic reactor, magnetically stirred...

Embodiment 2

[0028] Example 2 Adding bismuth tungstate to mixed solutions of different volumes of chloroauric acid and rhodamine B for photocatalytic experiments

[0029] Except that the volume of the chloroauric acid solution added is changed to 0.4 milliliters, 1.0 milliliters, and 1.3 milliliters respectively, the specific implementation is the same as in Example 1.

Embodiment 3

[0030] Example 3 Different photocatalysts were added to the mixed solution of chloroauric acid and rhodamine B for photocatalytic experiments

[0031] In addition to changing bismuth tungstate to one of photocatalysts such as tungsten oxide, bismuth vanadate, bismuth oxychloride, potassium niobate, tin niobate, barium tantalate, sodium niobate, and sodium tantalate, the specific implementation is the same Example 1.

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Abstract

The invention relates to the technical field of photocatalytic degradation and in particular relates to a method for rapidly removing aromatic N-alkyl dyestuff in dyestuff sewage. According to the method provided by the invention, a certain amount of a chloroauric acid (HAuCl4) solution is added into the dyestuff sewage and the aromatic N-alkyl dyestuff is rapidly removed by utilizing a photocatalyst under the irradiation of visible light.

Description

technical field [0001] The invention relates to the technical field of photocatalytic degradation, in particular to a method for rapidly removing aromatic N-alkyl dyes in dye sewage. The present invention adds a certain amount of chloroauric acid (HAuCl 4 ) solution, using a photocatalyst to quickly remove aromatic N-alkyl dyes under visible light irradiation. [0002] technical background [0003] Aromatic N-alkyl dyes including rhodamine B, methyl violet, methylene blue, malachite green, etc. are widely used in papermaking, textile printing and dyeing, leather manufacturing, colored glass coloring, cell fluorescent staining and fireworks manufacturing and other industries. These industries produce a large amount of aromatic N-alkyl dye wastewater, if not properly treated, it will cause great harm to human health and the ecological environment. As a cheap and efficient method to remove organic pollutants in water, photocatalytic technology has been developed rapidly in re...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C02F1/30C02F1/72C02F101/38C02F101/30
CPCC02F1/30C02F1/725C02F2101/308C02F2101/38C02F2305/10
Inventor 徐东波施伟东陈必义张正媛夏腾
Owner JIANGSU UNIV
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