Manufacturing method of molybdenum rotating target material for sputtering deposition
A technology of sputtering coating and manufacturing method, which is applied in the direction of sputtering coating, ion implantation coating, vacuum evaporation coating, etc., which can solve the problem of affecting the quality and yield of downstream products, insufficient target density, and target particle splashing and other problems to achieve the effect of good compactness, high yield and simple process
Inactive Publication Date: 2017-08-08
BAOTOU RES INST OF RARE EARTHS
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The invention discloses a manufacturing method of a molybdenum rotating target material for sputtering deposition. The method includes the steps that high-purity molybdenum powder is evenly filled into a tubular mold, and then is prepared into a tubular powder molybdenum billet by means of extrusion forming; the tubular powder molybdenum billet is put into a cold isostatic press to be pressed, and a molybdenum billet is obtained after isostatic pressing compaction is completed; the formed molybdenum billet is put into a vacuum sintering furnace to be sintered, the sintered molybdenum billet is put into the sintering furnace, hydrogen is connected in for protection, and the molybdenum billet is taken out for repeated hammer forging after heating and heat preservation are completed; the forged molybdenum billet is put into a vacuum annealing furnace for annealing, and then the molybdenum billet is cooled to an indoor temperature along with the furnace; and after the annealed molybdenum billet is machined, the molybdenum rotating target material can be obtained. The molybdenum rotating target material obtained through the method has the characteristics that the relative density is high, machinability is good, the inner grain structure of the target material is uniform and small and tissue defects are avoided.
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Property | Measurement | Unit |
Grain size | 5.0 ~ 15.0 | µm |
tensile | MPa | |
Particle size | Pa | |
strength | 10 |
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