Manufacturing method of molybdenum rotating target material for sputtering deposition

A technology of sputtering coating and manufacturing method, which is applied in the direction of sputtering coating, ion implantation coating, vacuum evaporation coating, etc., which can solve the problem of affecting the quality and yield of downstream products, insufficient target density, and target particle splashing and other problems to achieve the effect of good compactness, high yield and simple process

Inactive Publication Date: 2017-08-08
BAOTOU RES INST OF RARE EARTHS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In order to improve the utilization rate of the target, a tubular rotating target is usually used, so that the target utilization rate can be increased from 30% to 50% of the planar target to 80% of the rotating target. At present, the most commonly used process for forming molybdenum target is traditional powder Metallurgy, the target produced by this process has insufficient density and relatively coarse grains. During use, it is ea

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0026] Example 1

[0027] A method for manufacturing a molybdenum rotating target for sputtering coating specifically includes the following steps:

[0028] (1) Raw material: The powder used is high-purity molybdenum powder with purity ≥99.95%;

[0029] (2) Mold loading: evenly fill the powder in a tubular stainless steel mold with an outer diameter of 200mm and an inner diameter of 50mm, and press to prepare a tubular powdery molybdenum blank;

[0030] (3) Cold isostatic pressing: Put the tubular powdery molybdenum billet into a cold isostatic press for pressing, the pressing pressure is 180Mpa, and the pressure is maintained for 4 minutes;

[0031] (4) Sintering: Put the formed molybdenum billet into a vacuum sintering furnace, the sintering temperature is 1800℃, the vacuum degree is 2.5×10 -2 Pa, heat preservation for 5h;

[0032] (5) Forging: Put the sintered molybdenum billet into a sintering furnace, pass in hydrogen protection, use water circulation to cool down, heat to 1000℃, ke...

Example Embodiment

[0036] Example 2:

[0037] A method for manufacturing a molybdenum rotating target for sputtering coating specifically includes the following steps:

[0038] (1) Raw material: The powder used is high-purity molybdenum powder with purity ≥99.95%;

[0039] (2) Mold loading: evenly fill the powder in a tubular stainless steel mold with an outer diameter of 200mm and an inner diameter of 50mm, and press to prepare a tubular powdery molybdenum blank;

[0040] (3) Cold isostatic pressing: Put the tubular powdery molybdenum billet into a cold isostatic press for pressing, the pressing pressure is 200Mpa, and the pressure is maintained for 4 minutes;

[0041] (4) Sintering: Put the formed molybdenum billet into a vacuum sintering furnace, the sintering temperature is 1850℃, and the vacuum degree is 2.5×10 -2 Pa, heat preservation 6h;

[0042] (5) Forging: Put the sintered molybdenum billet into a sintering furnace, pass in hydrogen protection, use water circulation to cool down, heat to 1000℃, k...

Example Embodiment

[0046] Example 3:

[0047] (1) Raw material: The powder used is high-purity molybdenum powder with purity ≥99.95%;

[0048] (2) Mold loading: evenly fill the powder in a tubular stainless steel mold with an outer diameter of 200mm and an inner diameter of 50mm, and press to prepare a tubular powdery molybdenum blank;

[0049] (3) Cold isostatic pressing: Put the tubular powdery molybdenum billet into a cold isostatic press for pressing, the pressing pressure is 250Mpa, and the pressure is maintained for 4 minutes;

[0050] (4) Sintering: Put the formed molybdenum billet into a vacuum sintering furnace, the sintering temperature is 1900℃, and the heat preservation is 8h;

[0051] (5) Forging: Put the sintered molybdenum billet into a sintering furnace, pass in hydrogen protection, use water circulation to cool down, heat to 1000℃, keep it for 1~3h, take it out, and forge it with an air hammer with an impact of 1000 kg , Further improve the density of molybdenum billet;

[0052] (6) Annea...

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Abstract

The invention discloses a manufacturing method of a molybdenum rotating target material for sputtering deposition. The method includes the steps that high-purity molybdenum powder is evenly filled into a tubular mold, and then is prepared into a tubular powder molybdenum billet by means of extrusion forming; the tubular powder molybdenum billet is put into a cold isostatic press to be pressed, and a molybdenum billet is obtained after isostatic pressing compaction is completed; the formed molybdenum billet is put into a vacuum sintering furnace to be sintered, the sintered molybdenum billet is put into the sintering furnace, hydrogen is connected in for protection, and the molybdenum billet is taken out for repeated hammer forging after heating and heat preservation are completed; the forged molybdenum billet is put into a vacuum annealing furnace for annealing, and then the molybdenum billet is cooled to an indoor temperature along with the furnace; and after the annealed molybdenum billet is machined, the molybdenum rotating target material can be obtained. The molybdenum rotating target material obtained through the method has the characteristics that the relative density is high, machinability is good, the inner grain structure of the target material is uniform and small and tissue defects are avoided.

Description

technical field [0001] The invention relates to a sputtering target manufacturing technology, in particular to a method for manufacturing a molybdenum rotary target for sputtering coating. Background technique [0002] Molybdenum has high melting point, high electrical conductivity, low specific impedance, good corrosion resistance and good environmental performance. In the electronics industry, molybdenum sputtering targets are mainly used for flat-panel displays, electrode and wiring materials for thin-film solar cells, and barrier layer materials for semiconductors. With the rapid development of the flat panel display industry and the photovoltaic industry, the demand for molybdenum sputtering targets is increasing. [0003] In order to improve the utilization rate of the target, a tubular rotating target is usually used, so that the target utilization rate can be increased from 30% to 50% of the planar target to 80% of the rotating target. At present, the most commonly ...

Claims

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Application Information

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IPC IPC(8): C23C14/34B22F3/17
CPCC23C14/3414B22F3/17B22F2003/175B22F2998/10B22F3/02B22F3/04B22F3/1007B22F2003/248
Inventor 李慧孙良成鲁飞刘小鱼刘树峰邢正茂王峰白洋成宇陈蓓薪
Owner BAOTOU RES INST OF RARE EARTHS
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