Preparation method of tin selenide photovoltaic film
A photovoltaic thin film, tin selenide technology, applied in coatings, electrical components, circuits, etc., can solve the problems of complex process routes and high preparation costs, achieve low equipment requirements, low production costs, good continuity and uniformity Effect
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Embodiment 1
[0028] a. Cleaning of the substrate: Clean the silicon substrate as described above, with a size of 2cm×2cm.
[0029] b. Add 2.036 parts of SnCl 2 2H 2 O and 1.0 parts SeO 2 Put it into a glass bottle, add 54.545 parts of ethanol, and use ultrasonic vibration for more than 30 minutes to make the substances in the solution evenly mixed.
[0030] c. Drop the above solution onto the silicon substrate placed on the homogenizer, and then start the homogenizer. The homogenizer rotates at 200 rpm for 5 seconds, and at 1000 rpm for 15 seconds, so that the dripped solution is coated After the cloth is uniform, the substrate is dried at 100°C, and then the aforementioned solution is repeatedly dripped and spin-coated, and then dried again. This is repeated 8 times, and a precursor thin film sample with a certain thickness is obtained on the substrate.
[0031] d. Put the precursor film sample obtained by the above process into a sealable container, and put 18.182 parts of hydrazine h...
Embodiment 2
[0034] a. Cleaning of the substrate: Clean the silicon substrate as described above, with a size of 2cm×2cm.
[0035] b. Add 2.036 parts of SnCl 2 2H 2 O and 1.0 parts SeO 2 Put it into a glass bottle, add 54.545 parts of ethanol, and use ultrasonic vibration for more than 30 minutes to make the substances in the solution evenly mixed.
[0036]c. Drop the above solution onto the silicon substrate placed on the homogenizer, then start the homogenizer, rotate the homogenizer at 200 rpm for 5 seconds, and rotate at 3000 rpm for 15 seconds, so that the dripped solution is coated After the cloth is uniform, the substrate is dried at 100°C, and then the aforementioned solution is dripped and spin-coated again, and then dried again. This is repeated 8 times, and a precursor thin film sample with a certain thickness is obtained on the silicon substrate.
[0037] d. Put the precursor film sample obtained by the above process into a sealable container, and put 18.182 parts of hydrazi...
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