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Photosensitive resin and preparation method thereof

A photosensitive resin, resin technology, applied in the direction of additive processing, etc., can solve the problems of poor dispersibility, slurry sedimentation, high viscosity, etc., and achieve the effect of good fluidity and low viscosity of the system

Inactive Publication Date: 2018-03-06
SHENZHEN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In view of the above-mentioned deficiencies in the prior art, the object of the present invention is to provide a photosensitive resin and its preparation method, aiming to solve the problem that the existing ceramic slurry has a high viscosity, and the photocuring 3D printer used needs to be specially designed, and also encounters Problems such as slurry settling, poor dispersion, etc.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] Add 40g of polyethyl silicone resin, 10g of propyltrimethoxysilane, and 20ml of xylene into a beaker and stir evenly, then add dilute sulfuric acid and stir to obtain solution A; add 2.5ml of zirconium isopropoxide and 4ml of divinyl to another beaker Stir with triaminepentaacetic acid to obtain solution B; mix solution A and solution B, then add 10ml 1,6-hexanediol diacrylate, rotate evaporate at 45°C, add 2g phenylbis(2,4 , 6-trimethylbenzoyl) phosphine oxide was stirred to obtain a yellow homogeneous solution, which is a photosensitive resin configured in this embodiment.

Embodiment 2

[0044] Add 40g of polyethyl silicone resin, 20g of propyltrimethoxysilane, and 20ml of xylene into a beaker and stir evenly, then add dilute sulfuric acid and stir to obtain solution A; add 4.5ml of zirconium isopropoxide and 8ml of divinyl to another beaker Stir with triaminepentaacetic acid to obtain solution B; mix solution A and solution B, then add 10ml 1,6-hexanediol diacrylate, rotate evaporate at 45°C, add 5g phenylbis(2,4 , 6-trimethylbenzoyl) phosphine oxide was stirred to obtain a yellow homogeneous solution, which is a photosensitive resin configured in this embodiment.

Embodiment 3

[0046] Add 40g of polymethyl silicone resin, 10g of anilinomethyltriethoxysilane, and 20ml of tetrahydrofuran into a beaker and stir evenly, then add dilute sulfuric acid and stir to obtain solution A; add 4.5ml of pentaerythritol zinc, 8ml of diethylenetri Aminepentaacetic acid was stirred to obtain solution B; solution A and solution B were mixed, then 10ml trimethylolpropane triacrylate was added, rotary evaporation was performed at 45°C, and 2g 2-phenylbenzyl-2-dimethylamine- 1-(4-morpholine benzylphenyl) butanone was stirred to obtain a yellow homogeneous solution, which was a kind of photosensitive resin configured in this embodiment.

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Abstract

The invention discloses photosensitive resin and a preparation method thereof. The photosensitive resin is prepared by the following components in part by weight: 10-60 parts of organic silicone resinpowder, 5-15 parts of an organic solvent, 10-50 parts of a silane coupling agent, 0.5-3 parts of a catalyst, 0.1-10 parts of metal alkoxide, 0.1-10 parts of a complexing agent, 0.1-5 parts of a photo-initiator and 5-40 parts of an active diluent. The photosensitive resin prepared according to the formula has the advantages of low system viscosity and good fluidity; a used light-cured 3D printer is of an ordinary model without special design. The photosensitive resin disclosed by the invention is suitable for a DLP or SLA type 3D printer, and a printed model has a certain strength and can be converted into ceramics after high-temperature processing.

Description

technical field [0001] The invention relates to the technical field of polymer materials, in particular to a photosensitive resin and a preparation method thereof. Background technique [0002] Light-curing rapid prototyping technology is currently the most widely used rapid prototyping technology, and it is also the earliest commercialized, fastest-growing and most mature rapid prototyping technology. Commonly used photocuring rapid prototyping technologies mainly include: stereolithography rapid prototyping technology (Stereolithography, SLA) and digital light projection rapid prototyping technology (Digital Light Processing, DLP). This technology uses photosensitive resin as the raw material. Under the control of the computer, the ultraviolet light source scans and cures point by point or layer by layer according to the trajectory of the cross-sectional profile of each layer, and accumulates layers to form the entire product prototype. Light-curing rapid prototyping tech...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08F283/12C08F222/14C08K5/544C08K5/5419C08K5/5425C08K5/057C08K5/17C08K5/00B33Y70/00C04B35/00C04B35/622
CPCC04B35/00C04B35/622C08F283/12C08K5/00C08K5/057C08K5/175C08K5/5419C08K5/5425C08K5/544B33Y70/00C08K2201/014C08F222/103C08F222/102
Inventor 劳长石傅岳龙何奕
Owner SHENZHEN UNIV
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