Manufacturing method of reverse osmosis membrane
A manufacturing method and technology of reverse osmosis membrane, applied in the direction of reverse osmosis, separation method, semi-permeable membrane separation, etc., can solve the problem that it is difficult to take into account the improvement of rejection rate and the increase of permeation rate
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Embodiment 1
[0121] (porous support substrate)
[0122] An ultrafiltration membrane (trade name "GR40PP", manufactured by Alfa Laval Co., Ltd.) was prepared as a porous support substrate. The porous support substrate includes a resin nonwoven backing layer and a polysulfone (PSF) porous plastic layer laminated on one surface of the backing layer.
[0123] (coating film forming process)
[0124] By dripping a polyvinylpyrrolidone (PVP) solution (10% by mass) on the porous plastic layer and spreading the solution uniformly with a bar coater, a layer containing polyvinylpyrrolidone (PVP) is formed on the surface of the porous support substrate. A PVP coating film (coating film) of a vinylpyrrolidone (PVP) solution (10% by mass). Then, it was allowed to stand at room temperature for 10 hours to dry the PVP coating film on the porous support substrate, thereby obtaining a porous support substrate with a PVP coating film.
[0125] In addition, as PVP in the PVP solution, PVP powder (trade nam...
Embodiment 2
[0142] A reverse osmosis membrane in which a carbon membrane was formed on a porous support substrate was obtained in the same manner as in Example 1 except for the carbon membrane formation step. The film-forming conditions of the carbon film in Example 2 are as follows.
[0143]
[0144] ·Film forming device: batch type carbon film forming device
[0145] Duty cycle: 25%
[0146] ·Frequency: 1.5kHz
[0147] ·Duty cycle: 180μs
[0148] · Process gas (ratio): Ar (48%), N 2 (48%), CH 4 (4%)
[0149] Target material: high-purity graphite (purity: 99.999%)
[0150] ·Peak power density: 2.91Wcm -2
[0151] Power density: 0.23Wcm -2
[0152] ·Film forming pressure: 0.64Pa
[0153] ·Film forming time: 315 seconds
Embodiment 3
[0155] A reverse osmosis membrane in which a carbon membrane was formed on a porous support substrate was obtained in the same manner as in Example 1 except for the carbon membrane formation step. The film-forming conditions of the carbon film in Example 3 are as follows.
[0156]
[0157] ·Film forming device: batch type carbon film forming device
[0158] Duty cycle: 25%
[0159] ·Frequency: 1.5kHz
[0160] ·Duty cycle: 180μs
[0161] · Process gas (ratio): Ar (48%), N 2 (48%), CH 4 (4%)
[0162] Target material: high-purity graphite (purity: 99.999%)
[0163] ·Peak power density: 2.91Wcm -2
[0164] Power density: 0.23Wcm -2
[0165] ·Film forming pressure: 0.64Pa
[0166] ·Film forming time: 262 seconds
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