A method for preparing pt-al high temperature protective coating on the surface of niobium alloy
A protective coating, niobium alloy technology, applied in metal material coating process, coating, solid-state diffusion coating and other directions, can solve the problems of limited application, poor oxidation resistance of niobium, etc., to achieve simple operation, improved oxidation resistance, Reduce the effect of sample damage
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Embodiment 1
[0024] A method for preparing a Pt-Al high-temperature protective coating on the surface of a niobium alloy, comprising the following steps:
[0025] 1. Select C103 niobium alloy as the substrate, and its chemical composition is shown in the table below
[0026] Element f Ti Zr W Ta Nb Content wt (%) 10.0 1.30 0.34 0.31 0.30 Bal.
[0027] Pre-treat the surface of the niobium alloy substrate, polish it with 240#, 400#, 600#, 800#, 1000# and 1500# sandpaper in sequence, clean it with acetone ultrasonically, rinse it with deionized water, and dry it for later use;
[0028] 2. Put the niobium alloy substrate processed in step 1 into the MSP-1S ion sputtering apparatus to prepare the Pt layer; the target is a Pt target with a purity of 99.9-99.999%; the target is placed on the niobium alloy substrate platform The distance is 25mm, the vacuum rate is 20I / min, the sputtering vacuum is 10Pa, the current is 47mA, the sputtering time is 2min, and a P...
Embodiment 2
[0031] 1. Select C103 niobium alloy as the substrate, and its chemical composition is shown in the table below
[0032] Element f Ti Zr W Ta Nb Content wt (%) 10.0 1.30 0.34 0.31 0.30 Bal.
[0033] Pre-treat the surface of the niobium alloy substrate, polish it with 240#, 400#, 600#, 800#, 1000# and 1500# sandpaper in sequence, clean it with acetone ultrasonically, rinse it with deionized water, and dry it for later use;
[0034] 2. Put the niobium alloy substrate processed in step 1 into the MSP-1S ion sputtering apparatus to prepare the Pt layer; the target is a Pt target with a purity of 99.9-99.999%; the target is placed on the niobium alloy substrate platform The distance is 25mm, the vacuum rate is 20I / min, the sputtering vacuum is 10Pa, the current is 47mA, the sputtering time is 2min, and a Pt layer with a thickness of 8-12nm is prepared on the surface of the niobium alloy substrate;
[0035] 3. The niobium alloy substrate containin...
Embodiment 3
[0037] 1. Select C103 niobium alloy as the substrate, and its chemical composition is shown in the table below
[0038] Element f Ti Zr W Ta Nb Content wt (%) 10.0 1.30 0.34 0.31 0.30 Bal.
[0039] Pre-treat the surface of the niobium alloy substrate, polish it with 240#, 400#, 600#, 800#, 1000# and 1500# sandpaper in sequence, clean it with acetone ultrasonically, rinse it with deionized water, and dry it for later use;
[0040]2. Put the niobium alloy substrate processed in step 1 into the MSP-1S ion sputtering apparatus to prepare the Pt layer; the target is a Pt target with a purity of 99.9-99.999%; the target is placed on the niobium alloy substrate platform The distance is 25mm, the vacuum rate is 20I / min, the sputtering vacuum is 10Pa, the current is 47mA, the sputtering time is 2min, and a Pt layer with a thickness of 8-12nm is prepared on the surface of the niobium alloy substrate;
[0041] 3. The niobium alloy substrate containing...
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