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Hydrogen sensor, preparation method thereof, and method for realizing hydrogen detection

A sensor, hydrogen technology, applied in the field of sensors, can solve problems such as weakening optical response, and achieve the effect of improving sensitivity

Active Publication Date: 2020-06-09
SUN YAT SEN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Generally, the surface plasmon optical hydrogen sensor adopts metal nanoparticles or nanostructures prepared on a rigid substrate, which limits the volume expansion of the hydrogen-sensitive metal nanostructures during the hydrogen absorption process and greatly weakens the structural geometry. induced optical response

Method used

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  • Hydrogen sensor, preparation method thereof, and method for realizing hydrogen detection
  • Hydrogen sensor, preparation method thereof, and method for realizing hydrogen detection
  • Hydrogen sensor, preparation method thereof, and method for realizing hydrogen detection

Examples

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preparation example Construction

[0060] Such as Figure 4 As shown, the preparation method of the above-mentioned hydrogen sensor of an embodiment comprises the following steps:

[0061] S1: Formation of an adhesive film on a rigid substrate.

[0062] Specifically, a layer of adhesive film 140 is formed on the rigid substrate 130 by spin coating, such as Figure 5 shown. Wherein, the rigid substrate 130 may be a transparent rigid substrate such as quartz. The adhesive film 140 may be a polymethyl methacrylate film, a polyethylene film, or a polypropylene film. The adhesive film 140 is convenient for the subsequent formation of the photoresist layer, and the thickness of the adhesive film 140 may be 30nm-200nm.

[0063] S2: Under darkroom conditions, a photoresist layer is formed on the adhesive film.

[0064] Specifically, such as Image 6 As shown, a photoresist layer 150 is formed on the adhesive film 140 by spin coating. The photoresist layer 150 may have a thickness of 80nm-600nm. Wherein, the pho...

Embodiment 1

[0103] (1) At room temperature, under darkroom conditions, spin-coat polymethyl methacrylate film and photoresist film successively on a clean quartz substrate; wherein, the thickness of polymethyl methacrylate film is 50nm, photoresist The thickness of the film is 90nm;

[0104] (2) Carry out double-beam exposure and development to the photoresist, so that the photoresist layer has a nano-grating structure; wherein, the conditions for performing double-beam exposure and development are: the incident angle of the double-beam is 34.9 degrees, and the exposure time is 50 seconds, the developing time is 60 seconds, and the developing temperature is 21 degrees;

[0105] (3) Put the treated photoresist and the release agent perfluorooctyltrichlorosilane together into a vacuum dish, vacuumize, and after standing for 40 minutes, the release agent molecules volatilize and cover the photoresist template;

[0106] (4) Add 3.4g of methylvinyldimethyl (siloxane and polysiloxane), 100mg o...

Embodiment 2

[0114]The hydrogen sensor was prepared according to the steps of Example 1, except that the size parameters of the nano-grating structure were: the period was 1000 nm, the groove depth was 90 nm, the groove opening width was 370 nm, and the groove bottom width was 240 nm.

[0115] The hydrogen sensor prepared in Example 2 was put into a gas flow cell, fed with pure nitrogen, and its reflectance spectrum was measured with a UV-Vis-Near-Infrared Spectrophotometer (Lambda 950, PerkinElmer). Pass into 4% hydrogen (the mixed gas of hydrogen and nitrogen, the volume ratio of hydrogen and nitrogen is 4:96) then, adopt ultraviolet-visible-near-infrared spectrophotometer (Lambda950, PerkinElmer) to measure its reflection spectrum, measurement result is as follows Figure 12 shown. According to the reflectance spectrum measurement and calibration method in Example 1, it is measured that the resonance wavelength has shifted by 28nm, and the full width at half maximum of the resonance is ...

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Abstract

The invention relates to a hydrogen sensor, a preparation method thereof, and a method for realizing hydrogen detection by using the hydrogen sensor. It includes an elastic substrate and a hydrogen-sensitive material nanostructure on the elastic substrate; the surface of the elastic substrate close to the hydrogen-sensitive material nanostructure has a nano-array structure, and the hydrogen-sensitive material nanostructure is connected to the The nanoarray structures complement each other. The above-mentioned hydrogen sensor and the method for realizing hydrogen detection by using the hydrogen sensor have high sensitivity and are easy to manufacture.

Description

technical field [0001] The invention relates to the technical field of sensors, in particular to a hydrogen sensor, a preparation method thereof, and a method for realizing hydrogen detection by using the hydrogen sensor. Background technique [0002] As a clean and renewable energy carrier, hydrogen is regarded as an ideal energy source to replace traditional fossil fuels. With the continuous development of hydrogen fuel cell technology, how to ensure the safe and efficient production, storage and use of hydrogen has become a key issue in the era of "hydrogen economy". However, hydrogen has a very wide explosion limit (volume density of 4%-75%) and very low ignition energy (0.02mJ). Therefore, the hydrogen sensor is very necessary for the application of hydrogen. [0003] Hydrogen sensors mainly include sensors using electrical sensing and optical hydrogen sensors. Among them, optical sensors mainly include surface plasmon sensors and film structure sensors. The surface...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/69
CPCG01N21/69G01N33/005G01N21/554G01N2021/7773G01N2021/7783G01N21/77
Inventor 金崇君沈杨佘晓毅
Owner SUN YAT SEN UNIV
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