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Columnar array photocatalyst for sewage treatment and preparation method thereof

A sewage treatment and photocatalyst technology, which is applied in the direction of light water/sewage treatment, water/sludge/sewage treatment, physical/chemical process catalyst, etc., can solve the problems of poor photocatalytic efficiency and effect, low specific surface area, and high cost , to achieve the effect of improving the catalytic degradation of pollutants, increasing the specific surface area, and increasing the specific surface area

Inactive Publication Date: 2018-06-22
CHENDU NEW KELI CHEM SCI CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] Due to the low specific surface area, low light utilization rate, poor photocatalytic efficiency and effect, and poor stability of the currently widely used nano-zinc oxide photocatalyst, as well as the traditional modification technology is complicated, the modification effect is poor, and the cost Higher problem, the present invention proposes a method for preparing a columnar array photocatalyst for sewage treatment, thereby effectively improving the specific surface area of ​​the nano-zinc oxide photocatalyst, and significantly improving the photocatalytic activity and efficiency

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] (1) The specific process of preparing the substrate of the columnar array structure is as follows:

[0033] A thin layer of resist with a columnar array structure is used to mask the surface of the substrate, and then a photolithography machine is used to expose, develop, rinse and bake to obtain a substrate with a columnar array structure; the resist is novolac resin; the substrate is organic Silicone resin; UV lamp is used for non-contact exposure with a wavelength of 4000 angstroms; D-7 developer is used for development, and the developing temperature is 38°C; the baking temperature is 130°C, and the time is 25min;

[0034] (2) The specific process of the substrate’s adsorption of zinc acetate is:

[0035] First prepare a mixed solution of anhydrous zinc acetate, ethanolamine and ethylene glycol methyl ether, then immerse the columnar array substrate in the mixed solution for a certain period of time to make the surface of the substrate adsorb zinc acetate, and then ...

Embodiment 2

[0040] (1) The specific process of preparing the substrate of the columnar array structure is as follows:

[0041] A thin layer of resist with a columnar array structure is used to mask the surface of the substrate, and then a photolithography machine is used to expose, develop, rinse and bake to obtain a substrate with a columnar array structure; the resist is epoxy acrylate resin and phenolic resin A blend of resins; the substrate is silicone resin; the exposure is non-contact exposure with a UV lamp, the wavelength is 3800 angstroms; the development is using D-19 developer, and the development temperature is 35 ° C; 30min;

[0042] (2) The specific process of the substrate’s adsorption of zinc acetate is:

[0043] First prepare a mixed solution of anhydrous zinc acetate, ethanolamine and ethylene glycol methyl ether, then immerse the columnar array substrate in the mixed solution for a certain period of time to make the surface of the substrate adsorb zinc acetate, and then ...

Embodiment 3

[0048] (1) The specific process of preparing the substrate of the columnar array structure is as follows:

[0049] A thin layer of resist with a columnar array structure is used to mask the surface of the substrate, and then a photolithography machine is used to expose, develop, rinse and bake to obtain a substrate with a columnar array structure; the resist is novolac resin; the substrate is organic Silicone resin; UV light was used for non-contact exposure with a wavelength of 4200 angstroms; D-7 developer was used for development, and the developing temperature was 42°C; the baking temperature was 140°C, and the time was 20 minutes;

[0050] (2) The specific process of the substrate’s adsorption of zinc acetate is:

[0051] First prepare a mixed solution of anhydrous zinc acetate, ethanolamine and ethylene glycol methyl ether, then immerse the columnar array substrate in the mixed solution for a certain period of time to make the surface of the substrate adsorb zinc acetate...

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Abstract

The invention relates to the field of sewage treatment and discloses a preparation method of a columnar array photocatalyst for sewage treatment. The preparation method comprises the following preparation processes: (1) masking a substrate surface with a resist thin layer, and then, preparing a substrate with a columnar array structure through photoetching technique; (2) preparing a mixed solutionfrom 25-28% of anhydrous zinc acetate, 15-20% of ethanolamine and 52-60% of ethylene glycol monomethyl ether, immersing the substrate with the columnar array structure in the obtained mixed solution,and lifting and drying the substrate, thereby completing absorption of the substrate to the zinc acetate; and (3) calcining the zinc acetate on the substrate to obtain a nano zinc oxide photocatalystwith a columnar array structure for sewage treatment. Compared with a common photocatalyst, the photocatalyst prepared by the preparation method disclosed by the invention has the advantages of beinglarge in specific surface area, high in light energy utilization ratio, high in photocatalysis activity, high in catalysis efficiency, good in stability, capable of realizing effective catalytic degradation of pollutants in water, simple in process, easily available in raw material, low in production cost and pollution-free to the environment and has large-scale popularization and production prospects.

Description

technical field [0001] The invention relates to the field of sewage treatment, and discloses a columnar array photocatalyst for sewage treatment and a preparation method thereof. Background technique [0002] With the development of social economy and urbanization, the shortage of water resources and the pollution of water environment have become global problems in this century and are becoming more and more serious. The resulting water crisis has also become an important factor restricting the sustainable development of my country's social economy. In recent years, the main methods for the application of catalysts in sewage treatment are photocatalyst method, Fenton method reagent method, heterogeneous catalytic oxidation, electrocatalytic treatment of sewage, enzyme catalytic treatment of sewage, etc. Among them, photocatalytic method is an emerging high-efficiency and energy-saving method. Modern sewage treatment technology has attracted much attention. [0003] Photocat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J23/06B01J35/10C02F1/30
CPCC02F1/30B01J23/06C02F2305/10B01J35/61B01J35/39
Inventor 陈庆司文彬
Owner CHENDU NEW KELI CHEM SCI CO LTD
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