Method for increasing fused quartz damage threshold based on inertia ion implantation method
A technology of ion implantation and damage threshold, which is applied in the field of optical element manufacturing, can solve the problems of forming a compressive stress layer and difficult fused silica surface, etc., and achieve the effect of prolonging the service life, increasing the laser damage threshold, and compressive stress conveniently and effectively
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Embodiment 1
[0026] Sample group A: The size of the optically polished fused silica element is 30mm×30mm×4mm. The surface of the previously processed fused silica element is ultrasonically cleaned with deionized water and absolute ethanol in sequence. The ultrasonic frequency is 40kHz, and the ultrasonic cleaning time is 15min respectively. Remove oil stains, powder and other pollutants on the surface of the component; then use a mass fraction of 1% HF + 30% NH 4 F+69%H 2 O hydrofluoric acid buffer solution etched the element for 10 minutes to remove the polished deposit on the surface of the element and initially passivate the surface and subsurface defects; use deionized water to spray and clean for 3 minutes to avoid deposition of reaction product deposits on the molten surface The surface of the quartz element is then dehydrated with absolute ethanol for later use.
[0027] Sample group B: On the basis of sample group A, argon ions were implanted on the surface of fused silica with an...
Embodiment 2
[0038] Sample group E: the size of the optically polished fused silica element is 30mm×30mm×4mm, and the surface of the previously processed fused silica element is ultrasonically cleaned with deionized water and absolute ethanol in sequence. The ultrasonic frequency is 80kHz, and the ultrasonic cleaning time is 10min respectively. , to remove oil stains, powder and other pollutants on the surface of the component; then use a mass fraction of 10% HF + 15% NH 4 F+75%H 2 O hydrofluoric acid buffer solution etched the components for 10 minutes to remove the polished deposition layer on the surface of the components and initially passivate the surface and subsurface defects; use deionized water to spray and clean for 5 minutes to avoid deposition of reaction product deposits on the molten surface The surface of the quartz element is then dehydrated with absolute ethanol for later use.
[0039] Sample group F: On the basis of sample group E, argon ions were implanted on the surfac...
Embodiment 3
[0048] Sample group H: the size of the optically polished fused silica element is 30mm×30mm×4mm, and the surface of the previously processed fused silica element is ultrasonically cleaned with deionized water and absolute ethanol in sequence. The ultrasonic frequency is 100kHz, and the ultrasonic cleaning time is 10 minutes respectively. , to remove oil stains, powder and other pollutants on the surface of the component; then use a mass fraction of 5% HF + 20% NH 4 F+75%H 2 O hydrofluoric acid buffer solution etched the element for 5 minutes to remove the polished deposition layer on the surface of the element and initially passivate the surface and subsurface defects; use deionized water to spray and clean for 10 minutes to avoid deposition of reaction product deposits on the molten surface The surface of the quartz element is then dehydrated with ethanol.
[0049] Sample Group I: On the basis of sample H, use an ion implanter to implant argon ions onto the surface of fused ...
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