Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Aluminum oxide polishing solution used for polishing sapphire and preparation method thereof

A polishing liquid and alumina technology, applied in the field of sapphire polishing, can solve the problems of excessive loss of auxiliary materials, high surface roughness of wafers, low polishing efficiency and yield, etc., achieving low cost, excellent lubrication effect, and being conducive to industrialization. applied effect

Active Publication Date: 2018-07-03
LENS TECH CHANGSHA
View PDF14 Cites 23 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] The object of the present invention is to provide a kind of aluminum oxide polishing solution for sapphire polishing, to solve the ubiquitous problems of low polishing efficiency and yield rate, high wafer surface roughness, and excessive loss of auxiliary materials in the process of processing sapphire workpieces without reducing the polishing speed. technical issues

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Aluminum oxide polishing solution used for polishing sapphire and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] The dispersant used in embodiment 1 is polyvinyl alcohol, the lubricant is polyethylene glycol 200 and polyethylene glycol 400, the complexing agent is sodium gluconate, the preservative is benzotriazole, and the pH regulator is Diethanolamine and Tetramethylammonium Hydroxide.

Embodiment 2

[0031]The dispersant used in embodiment 2 is alkylphenol polyoxyethylene ether, the lubricant is polyethylene glycol 200, the complexing agent is sodium lactate, the preservative is benzotriazole, and the pH regulator is triethanolamine, tetra Methylammonium Hydroxide and Tetraethylammonium Hydroxide.

Embodiment 3

[0032] The dispersant used in embodiment 3 is fatty alcohol polyoxyethylene ether, and lubricant is polyethylene glycol 200 and glycerin, and complexing agent is potassium citrate, and antiseptic is benzotriazole, and pH regulator is four Ethyl ammonium hydroxide.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides aluminum oxide polishing solution used for polishing sapphire. The aluminum oxide polishing solution is aqueous solution comprising the following components: 12-26wt% of alpha-aluminum oxide powder with the particle size of 80-350nm, 0.5-1.2wt% of a dispersing agent, 0.04-1.2wt% of a lubricating agent, 0.05-0.7wt% of a complexing agent, 0.08-0.4wt% of a preservative and 2.4-5wt% of a pH value regulator, wherein the dispersing agent is one or more than one of poly vinyl alcohol, polyvinylpyrrolidone, alkylphenol polyoxyethylene and fatty alcohol polyoxyethylene ether, thelubricating agent is one or more than one of polyethylene glycol 400, polyethylene glycol 600 and glycerin, the complexing agent is one or more than one of sodium gluconate, sodium lactate and potassium citrate, and the preservative is one or more than one of benzotriazole, potassium borate and sodium borate. The polishing solution provided by the invention has high polishing efficiency in a sapphire processing process, lubricating effect is excellent, a processed product surface is good in quality, and the polishing solution is simple in preparation method, low in cost and beneficial to industrial popularization and application.

Description

technical field [0001] The invention relates to the technical field of sapphire polishing, in particular to an alumina polishing liquid for sapphire polishing and a preparation method thereof. Background technique [0002] Sapphire, also known as white gemstone, has the molecular formula Al 2 o 3 , is a multifunctional oxide crystal with a hexagonal crystal structure and a Mohs hardness of 9, second only to diamond. It has excellent optical, physical and chemical properties. Compared with natural gemstones, it has the characteristics of high hardness, high melting point, good light transmission, excellent thermal conductivity and electrical insulation, good mechanical and mechanical properties, good wear resistance, and stable corrosion resistance. , national defense and other fields have a wide range of applications. [0003] With the continuous development of science and technology, the sapphire workpiece must have a high surface quality, so the requirements for the sur...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C09G1/02
CPCC09G1/02
Inventor 周群飞饶桥兵杨水莲
Owner LENS TECH CHANGSHA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com