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A self-assembled micro-nano structure bivo 4 A Simple Preparation Method of Microspheres

A technology of micro-nano structure and self-assembly, applied in the field of photocatalysis, to achieve the effect of simple and easy-to-control preparation process

Active Publication Date: 2020-04-28
TIANJIN CHENGJIAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

TiO 2 and ZnO are wide-bandgap semiconductor materials, which only respond to ultraviolet light, and the utilization rate of light only accounts for 5%.

Method used

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  • A self-assembled micro-nano structure bivo  <sub>4</sub> A Simple Preparation Method of Microspheres
  • A self-assembled micro-nano structure bivo  <sub>4</sub> A Simple Preparation Method of Microspheres
  • A self-assembled micro-nano structure bivo  <sub>4</sub> A Simple Preparation Method of Microspheres

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] figure 1 with figure 2 For the BiVO prepared in Example 1 4 The SEM image of microspheres, using the BiVO prepared in Example 1 4 The microspheres are composed of irregular polyhedrons, uniformly dispersed and large in size.

[0032] 2mmol (0.97g) Bi(NO 3 ) 3 ·5H 2 O was added to 30mLHAc (purity 99.5%), stirred until completely dissolved, as solution A; 2mmol (0.368g) of Na 3 VO 4 Add to 5mL of deionized water, stir until completely dissolved, then add 30mL of HAc (purity 99.5%), continue to stir for 30min, as solution B; add solution B dropwise to solution A, and continue to stir for 30min; mix The final solution C was transferred to a 100mL reactor and subjected to hydrothermal reaction at 140°C for 4h; after the reactor was cooled to room temperature, the reaction product was centrifuged and washed three times with deionized water and absolute ethanol; The obtained powder was dried in an oven at 60°C for 6 hours; the dried powder was placed in a muffle furna...

Embodiment 2

[0034] image 3 with Figure 4 For the BiVO prepared in Example 2 4 The SEM image of microspheres, using the BiVO prepared in Example 2 4 The surface of the microspheres has a quadrangular pyramid structure, which is uniformly dispersed and has large particles.

[0035] 2mmol (0.97g) Bi(NO 3 ) 3 ·5H 2 O was added to 30mLHAc (purity 99.5%), stirred until completely dissolved, as solution A; 2mmol (0.368g) of Na 3 VO 4Add to 5mL of deionized water, stir until completely dissolved, then add 30mL of HAc (purity 99.5%), continue to stir for 30min, as solution B; add solution B dropwise to solution A, and continue to stir for 30min; mix The final solution C was transferred to a 100mL reactor and subjected to hydrothermal reaction at 140°C for 6h; after the reactor was cooled to room temperature, the reaction product was centrifuged and washed three times with deionized water and absolute ethanol; The obtained powder was dried in an oven at 60°C for 6 hours; the dried powder ...

Embodiment 3

[0037] Figure 5 with Image 6 For the BiVO prepared in Example 3 4 The SEM image of microspheres, using the BiVO prepared in Example 3 4 The surface of the microspheres has a quadrangular pyramid structure, which is uniformly dispersed and has large particles.

[0038] 2mmol (0.97g) Bi(NO 3 ) 3 ·5H 2 O was added to 30mLHAc (purity 99.5%), stirred until completely dissolved, as solution A; 2mmol (0.368g) of Na 3 VO 4 Add to 5mL of deionized water, stir until completely dissolved, then add 30mL of HAc (purity 99.5%), continue to stir for 30min, as solution B; add solution B dropwise to solution A, and continue to stir for 30min; mix The final solution C was transferred to a 100mL reactor and subjected to hydrothermal reaction at 140°C for 8h; after the reactor was cooled to room temperature, the reaction product was centrifuged and washed three times with deionized water and absolute ethanol; The obtained powder was dried in an oven at 60°C for 6 hours; the dried powder...

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Abstract

The invention discloses a simple preparation method of self-assembled micro-nano structural BiVO4 microspheres. The simple preparation method includes the steps of adding bismuth nitrate into glacialacetic acid with stirring until dissolving completely to obtain a solution A; adding sodium vanadate into deionized water with stirring until dissolving completely, adding glacial acetic acid, continuously stirring for 30 minutes to obtain a solution B; adding the solution B dropwise into the solution A, continuously stirring for 30 minutes to obtain a mixed solution, transferring the mixed solution into a 100mL reaction kettle, performing hydrothermal reaction at the temperature of 140 DEG C for 6 hours; subjecting reaction products to centrifugal separation after the reaction kettle is cooled to the room temperature, washing the separated products three times by deionized water and absolute ethyl alcohol, and them drying; placing the dried powder in a muffle furnace, holding the temperature of 400 DEG C for 2 hours so as to obtain the micro-nano structural BiVO4 microspheres.

Description

technical field [0001] The invention relates to the field of photocatalysis technology, especially a BiVO with micro-nano structure 4 Preparation method of microspheres. Background technique [0002] Semiconductor material is a material that utilizes the energy provided by solar energy to deal with environmental pollution and produce clean energy. Common semiconductor materials are TiO 2 , ZnO, BiPO 4 and BiVO 4 Wait. TiO 2 and ZnO are wide bandgap semiconductor materials, which only respond to ultraviolet light, and the utilization rate of light only accounts for 5%. And BiVO 4 It is a narrow bandgap semiconductor material that responds to visible light and has a high absorption and utilization rate of sunlight. It can be used to degrade organic pollutants and develop clean energy. The morphology of photocatalysts has a great influence on the degradation of organic matter and the utilization rate of light absorption. Usually, such as BiVO with structures such as oc...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01G31/00B82Y30/00B82Y40/00
CPCB82Y30/00B82Y40/00C01G31/00C01P2004/32C01P2004/50
Inventor 鄂磊胡朝阳胡康慨赵丹
Owner TIANJIN CHENGJIAN UNIV
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