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A composite gate igbt chip with three-dimensional channel

A compound gate and chip technology, applied in semiconductor devices, electrical components, circuits, etc., to achieve the effect of reducing on-voltage drop, small parasitic capacitance, and reducing parasitic resistance

Active Publication Date: 2020-11-10
ZHUZHOU CRRC TIMES SEMICON CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] figure 2 and image 3 The bottom of the trench gate has a certain limit on the resistance capacity of the IGBT chip
its with figure 1 Compared with the IGBT chip with a planar gate structure shown in the figure, while improving the performance of the IGBT chip, it also sacrifices part of the withstand voltage and solid performance of the planar gate.

Method used

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  • A composite gate igbt chip with three-dimensional channel
  • A composite gate igbt chip with three-dimensional channel
  • A composite gate igbt chip with three-dimensional channel

Examples

Experimental program
Comparison scheme
Effect test

no. 1 example

[0041] The composite gate IGBT chip of this embodiment includes a plurality of cells. In order to more clearly illustrate the composite gate IGBT chip of this embodiment, the following uses Figure 4 The schematic diagram of the structure of a single bar-shaped cell is shown as an example for detailed explanation.

[0042] Figure 4 It is a schematic structural diagram of a composite gate IGBT chip with a three-dimensional channel in the first embodiment of the present invention. Such as Figure 4As shown, it includes a substrate 1 , cells disposed on the substrate 1 , and an N-type buffer layer 2 , a P-type layer 3 and an anode metal layer 4 disposed below the substrate 1 . Among them, the cell mainly includes: a trench polysilicon gate electrode 5, a first oxide layer 6, two P well regions 7, two doped regions (the doped regions include N++ doped regions 8 and P++ doped regions 9), Two second oxide layers 10 , two planar polysilicon gate electrodes 11 , two third oxide l...

no. 2 example

[0058] This embodiment is a further optimization of the first embodiment.

[0059] Figure 5 It is a schematic structural diagram of a composite gate IGBT chip with a three-dimensional channel in the second embodiment of the present invention. Such as Figure 5 shown in Figure 4 An N well region 15 is added to the shown cell. The N well region 15 is located below the P well region 7 and is in contact with the lower surface and the side of the P well region 7 , and the width of the N well region 15 is greater than that of the P well region 7 .

[0060] In this embodiment, an N well region is added around the P well region to further increase the conductance modulation effect of the IGBT chip in the drift region.

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Abstract

An IGBT chip having a composite gate and a three-dimensional trench. The IGBT chip comprises: a polysilicon trench gate electrode; a first oxide layer; a P well region; a doped region comprising an N++ doped region and a P++ doped region; a second oxide layer covering surfaces of regions at two sides of the P-well region, a surface portion of the P-well region not provided with the doped region, and a portion of the doped region; a polysilicon planar gate electrode; and a third oxide layer. Current density of the IGBT chip can thus be increased, reducing on-state voltage drop.

Description

technical field [0001] The invention relates to the technical field of semiconductor devices, in particular to a composite gate IGBT chip with a three-dimensional channel. Background technique [0002] Since the advent of IGBT (Insulated Gate Bipolar Transistor, Insulated Gate Bipolar Transistor) devices around 1980, due to the characteristics of bipolar transistor on-state voltage drop and high current density, and MOSFET (Metal-Oxide-Semiconductor Field -Effect Transistor, Metal-Oxide Semiconductor Field Effect Transistor) has high input impedance and fast response, and is widely used in rail transit, smart grid, industrial frequency conversion and new energy development and other fields. [0003] figure 1 It is a schematic cross-sectional view of a half cell of an IGBT chip with a planar gate structure in the prior art. Such as figure 1 As shown, it mainly includes: substrate 101, N well region 102, P well region 103, N+ doped region 104, P+ doped region 105, planar ga...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L29/739H01L29/06H01L29/423
CPCH01L29/0684H01L29/0696H01L29/423H01L29/7396H01L29/7397H01L29/1095H01L29/404H01L29/407H01L29/7395
Inventor 刘国友朱春林朱利恒
Owner ZHUZHOU CRRC TIMES SEMICON CO LTD
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