High-hardness alkali-free aluminoborosilicate glass suitable for float process production, and preparation method and application of aluminoborosilicate glass

A technology of borosilicate glass and float process, which is applied in glass manufacturing equipment, glass molding, manufacturing tools, etc. It can solve the problems of difficult glass melting, poor homogenization effect, and deterioration of film characteristics, so as to improve the hardness of glass , shorten the material properties, reduce the high temperature viscosity and the effect of melting temperature

Inactive Publication Date: 2018-11-30
WUHAN UNIV OF TECH
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Problems solved by technology

[0005] (2) Strictly control the alkali metal (Na 2 O, K 2 O, etc.), during the heat treatment process, if the alkali metal ions are contained, the alkali metal film will diffuse in the semiconductor material, resulting in the deterioration of the film characteristics, but the lack of alkali metal oxide (R 2 O) Fueling, resulting in difficult glass melting, difficult clarification, and poor homogenization effect, so the alkali content in the glass is generally controlled at 1000-2000ppm,

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  • High-hardness alkali-free aluminoborosilicate glass suitable for float process production, and preparation method and application of aluminoborosilicate glass
  • High-hardness alkali-free aluminoborosilicate glass suitable for float process production, and preparation method and application of aluminoborosilicate glass
  • High-hardness alkali-free aluminoborosilicate glass suitable for float process production, and preparation method and application of aluminoborosilicate glass

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preparation example Construction

[0032] The preparation method of a kind of high hardness alkali-free aluminoborosilicate glass provided by the present invention, the steps are as follows:

[0033] 1) Selection of raw materials: according to SiO 2 55.0~65.0%, Al 2 o 3 11.0-29.0%, B 2 o 3 2.0~9.0%, MgO 2.4~5.0%, SrO 4.6~10.0%, CaO 2.5~5.5% ingredients, in terms of mass percentage, the sum of each oxide satisfies 100%, of which SiO 2 、Al 2 o 3 , B 2 o 3 , MgO, CaO, and SrO are respectively introduced from quartz sand, alumina, boric acid, light magnesium oxide, calcium carbonate, and strontium carbonate;

[0034] 2) Calculate the mass fraction of the batch according to the mass fraction of the above-mentioned oxides and weigh about 200g of the batch. After mixing evenly, add it to a platinum-rhodium alloy crucible and melt it, keep it warm at 1620-1660°C for 2-3 hours, and then melt the prepared The molten glass is poured into a stainless steel cast iron mold preheated to 200-300°C for rapid prototy...

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Abstract

The invention discloses high-hardness alkali-free aluminoborosilicate glass suitable for float process production and a preparation method of the aluminoborosilicate glass. Based on the content of oxides, the glass comprises the following components in percentage by mass: 55.0-65.0% of SiO2, 11.0-29.0% of Al2O3, 2.0-9.0% of B2O3, 2.4-5.0% of MgO, 4.6-10.0% of SrO and 2.5-5.5% of CaO. The inventionprovides substrate glass, especially substrate glass suitable for thin film transistor-liquid crystal display (TFT-LCD), wherein the Vickers hardness is higher than 670 kgf / mm<2>, the strain point exceeds 680 DEG C, the melting temperature is 1620-1660 DEG C, the annealing temperature is 700 DEG C, and the glass can be produced by a float process, has high elastic modulus and good chemical stability, and can be widely applied to panel display elements or other optoelectronic devices.

Description

technical field [0001] The invention belongs to the technical field of glass production, and in particular relates to a high-hardness alkali-free aluminoborosilicate glass that can be widely used in thin film transistor liquid crystal displays (TFT-LCDs) in the display industry and a preparation method and application thereof. Background technique [0002] TFT-LCD has many excellent characteristics such as stable working voltage, energy saving, light weight and high image quality, full color, high definition, high resolution, no radiation and no pollution, etc., and has been widely used. As the key basic material of TFT-LCD, substrate glass has two main functions: one is to keep the liquid crystal molecules at a certain thickness; the other is to carry the transparent electrodes and light-switching elements necessary for driving. At present, alkali-free aluminoborosilicate glass has been widely used in TFT-LCD substrate materials due to its excellent performance, and the qua...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C3/091C03B19/02H01L27/12
CPCC03B19/02C03C3/091H01L27/1218
Inventor 王静王维年韩建军刘超谢俊阮健
Owner WUHAN UNIV OF TECH
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