Preparation method of C1 doped glucose carbon based graphene

Abstract

The invention discloses a preparation method of C1 doped glucose carbon based graphene. The preparation method comprises following steps: glucose is mixed with hydrochloric acid, an obtained mixed solution is subjected to stirring boiling at the atmosphere environment until the solution viscosity ranges from 100000 to 1000000 centipoise; deionized water, absolute ethanol, and an obtained caramel solution are mixed at a certain ratio, and are filtered, an obtained filtrate is taken as a Cl doped precursor solution, the Cl doped precursor solution is subjected to spin coating of a quartz plate so as to obtain a spin coated sheet; the spin coated sheet is dried for 20 to 35min at a constant temperature, the dried spin coated sheet is subjected to 20 to 24h of annealing at 600 to 800 DEG C soas to obtain the C1 doped glucose carbon based graphene thin film. The preparation method is simple; the conditions are mild; the cost is low; the efficiency is high; the preparation method is friendly to the environment; and the prepared graphene material is controllable in doping amount, and large in test sample sheet diameter.

Description

technical field [0001] The invention belongs to the technical field of nano-graphene materials, and in particular relates to a preparation method of Cl-doped glucose carbon-based graphene. Background technique [0002] Graphene is a two-dimensional carbon material with excellent electrical, thermal, and mechanical properties. It has attracted extensive attention in many fields such as energy, electronic materials, biomedicine, and environmental protection. Necessary conditions for its application development. The existing graphene preparation technologies include reduced graphene oxide method, chemical vapor deposition method, epitaxial growth method, molecular self-assembly method, etc. Among them, the chemical reduction graphene oxide method can achieve large-scale production, but the prepared graphene has many defects. , and will inevitably produce certain pollution, and the chemical reagents used for reduction also have certain safety issues. Currently, they are mainly ...

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Problems solved by technology

The existing graphene preparation technologies include reduced graphene oxide method, chemical vapor deposition method, epitaxial growth method, molecular self-assembly method, etc. Among them, the chemical reduction graphene oxide method can achieve large-scale production, but the prepared graphene has many defects. , and will inevitably produce certain pollution, and there are certain safety issues in the chemical reagents used for reduction. At present, it is mainly used to produce functionalized graphene materials with functional groups

[0003] There are also many studies on the preparation of doped graphene at this stage. CN108163847A provides a method for preparing large-diameter graphene. The method uses graphite as the main raw material, high-viscosity syrup as the main auxiliary agent, and is prepared by mechanical exfoliation Large-diameter graphene, but the graphene prepared by this method has poor performance and is easily polluted by syrup additives, which not only loses the performance of intrinsic graphene, but also cannot obtain functionalized graphene with special functional groups

CN107973293A and CN107662917A also provide the method for preparing graphene, and this technology mainly utilizes mechanical exfoliation graphite to obtain agglomerated graphene and then decomposes graphene block through ultrasonic vibration, but the graphene block that mechanical exfoliation preparation method gained decomposes The post shape is inconsistent, difficult to standardize, and has serious defects that it is difficult to separate graphene from ultrasonic solvents

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