TSC ceramic film, and preparation method and application thereof
A ceramic thin film and film-forming technology, which is applied in ion implantation plating, metal material coating technology, coating, etc., can solve the problems of research in the field of optoelectronics, poor conductivity and transmittance, and infrared transmittance. Low-level problems, achieving good engineering application prospects, excellent near-infrared transmittance and conductivity, and reliable cost effects
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[0023] The present invention should adopt any suitable transparent substrate such as glass or quartz as the substrate, and the present embodiment adopts the K9 substrate and the quartz substrate as the substrate, adopts argon as the working gas, and conducts the process on it based on the DC sputtering method respectively. Thin film plating, prepare a kind of TSC ceramic film with high near-infrared light transmittance and conductivity, the specific operation is as follows:
[0024] Step 1: Target preparation:
[0025] Ti 3 SiC 2 Add the powder into deionized water and stir evenly to obtain Ti 3 SiC 2 dispersion, and then the Ti 3 SiC 2 Put the dispersion into an aluminum tray with a diameter of 90mm and a thickness of 3-4mm, and then put the aluminum tray in a vacuum oven at 120°C for 24 hours and take it out. Based on the above operations, a DC sputtering target is prepared. It should be vacuum-sealed and placed. For the target, please refer to the attached figure 1 ; ...
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