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Preparation method for nitrogen defect modified inverse opal structure carbon nitride

A technology of structural carbon nitride and inverse opal, which is applied in the field of photocatalysis to achieve the effects of enhancing light transmission rate and utilization rate, optimizing energy band structure, and increasing active sites.

Inactive Publication Date: 2018-12-21
EAST CHINA UNIV OF SCI & TECH
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  • Application Information

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Problems solved by technology

In the process of degrading antibiotics, the synergistic effect of the two characteristics can greatly improve the degradation efficiency of pollutants, which is obviously better than other types of catalysts. From the existing research, the inverse opal structure modified by nitrogen defects has not yet been nitrogenated. Carbon has been reported

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  • Preparation method for nitrogen defect modified inverse opal structure carbon nitride
  • Preparation method for nitrogen defect modified inverse opal structure carbon nitride
  • Preparation method for nitrogen defect modified inverse opal structure carbon nitride

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Embodiment

[0021] Preparation of nitrogen-deficient inverse opal-structured carbon nitride

[0022] Mix 0.6g of dicyandiamide, 1.0g of silica pellets with a diameter of about 200nm and 0.6g of ammonium chloride, grind and mix evenly, place in a porcelain ark, cover it, and put it in a tube calcined in a furnace. The heating rate was 2°C per minute, raised to 520°C and kept for 2 hours, then raised to 550°C at 4°C per minute, kept for 2 hours, and 0.2L / min of argon was continuously introduced throughout the process. After it was naturally cooled to room temperature, it was etched by 50mL 4mol / L ammonium bifluoride aqueous solution for 48h, and the centrifugal washing speed was 12500r / min, and the centrifugal time was 15min centrifugal washing, and dried to obtain 10 g-C 3 N 4 Nv.

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Abstract

The invention provides a preparation method for nitrogen defect modified inverse opal structure carbon nitride. In the method, a silica template, a carbon nitride precursor and a nitrogen defect forming agent are mixed and ground by a hard template method, calcined in an inert atmosphere, and then etched by an etchant to obtain nitrogen defect modified inverse opal structure carbon nitride. The method provided by the invention can introduce nitrogen defects and significantly improve activity while ensuring the inverse opal structure, prepared defect-rich catalyst has excellent photoelectric properties, and the catalyst applied to photocatalytic degradation of antibiotics shows very high catalytic activity. The material also has a good application prospect in photocatalysis fields of photocatalytic hydrogen production, reduction of CO2, production of H2O2 and the like.

Description

technical field [0001] The invention relates to a photocatalyst which can be used for efficiently degrading antibiotics and belongs to the technical field of photocatalysis. Background technique [0002] In recent years, with the massive growth of the population and the acceleration of the industrialization process, due to the untreated discharge of a large amount of industrial wastewater and domestic sewage, various organic pollutants have entered the environment, posing a great threat to the safety of drinking water and agricultural products. . Among them, various organic pollutants such as endocrine disruptors, antibiotics, and pesticides were detected in large quantities in the environment. For example, norfloxacin, as one of the widely used antibiotics for human use, has led to the enhancement of bacterial drug resistance, and the residual concentration level in the environment is getting higher and higher, which seriously threatens human health and safety. At the sam...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J27/24C02F1/30C02F103/34
CPCC02F1/30B01J27/24C02F2103/343B01J35/39
Inventor 刘勇弟雷菊英田云浩张金龙王灵芝周亮陈斌
Owner EAST CHINA UNIV OF SCI & TECH
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