Application method for preparing electronic grade hydrogen fluoride process device
A process device, hydrogen fluoride technology, applied in the direction of hydrogen fluoride, fluorine/hydrogen fluoride, chemical instruments and methods, etc., can solve problems such as safety accidents, increased difficulty and cost of treatment, non-compliance with technical specifications, etc.
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- Publication Date
- 2018-12-21
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Abstract
Description
technical field
[0001] The invention relates to the technical field of fluorine chemical industry, in particular to a method for using a process device for preparing electronic-grade hydrogen fluoride. Background technique
[0002] Electronic-grade hydrogen fluoride is mainly used as a cleaning agent and etchant in photovoltaics, integrated circuits and other industries. It is one of the key auxiliary materials in these industries. Since the impurity arsenic has a serious impact on the performance of electronic devices, the removal of arsenic is a must for the purification of hydrogen fluoride. The key technology is to use an oxidant to oxidize trivalent arsenic to a high-boiling pentavalent arsenic compound, and then use the difference in volatility to distill it out. Chinese invention patent (patent number CN201110276860.4, patent name is a method for preparing electronic grade hydrofluoric acid) discloses a method for preparing electronic grade hydrofluoric acid, includin...
Examples
Embodiment Construction
[0033] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.
[0034] Such as figure 1 , figure 2 , image 3 , Figure 4 , Figure 5 As shown, a method for preparing an electronic-grade hydrogen fluoride process device is characterized in that:
[0035]Step 1, inject anhydrous hydrogen fluoride into the circulation storage tank 3 of the transpiration circulation reactor I, observe through the sight glass to ensure that its liquid level is lower than the level of the gas-liquid separator 2 in the oxidation reaction kettle 1 by 3 to 5 cm, and pour into the oxidation reaction kettle 1. Feed fluorine gas to keep the air pressure in the oxidation reactor 1 balanced with the ambient air pressure. Observe the liquid level of the U-shaped liquid seal assembly at the bottom of the multi-stage liquid cyclone condenser II of the circulating fluidized bed distillation tower through a liquid level gauge to ensure ...